Inkjet plating resist for improved cell efficency

Dong, Hua; Barr, Robert; Hinkley, P.L.

doi:10.1109/pvsc.2010.5615932

Cited by 4 publications

(2 citation statements)

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“…In conventional electroless deposition process two major issues exist. The first one is called the ghost plating phenomenon, which leads to the formation of large metallic particles of tens of micrometres in dimensions on the SiN x ARC inducing shading losses, which reduce J sc of the solar cells [20][21][22][23]. The second issue is the corrosion and metallic contamination of the cells by using hydrofluoric acid (HF), which is considered as a formidable barrier for application in photovoltaic solar cells, thereby deteriorating the cell electrical performance.…”

Section: Resultsmentioning

confidence: 99%

Simultaneous broadband light trapping and fill factor enhancement in crystalline silicon solar cells induced by Ag nanoparticles and nanoshells

Fahim¹,

Jia²,

Shi³

et al. 2012

Opt. Express

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Crystalline silicon solar cells are predominant and occupying more than 89% of the global solar photovoltaic market. Despite the boom of the innovative solar technologies, few can provide a low-cost radical solution to dramatically boost the efficiency of crystalline silicon solar cells, which has reached plateau in the past ten years. Here, we present a novel strategy to simultaneously achieve dramatic enhancement in the short-circuit current and the fill factor through the integration of Ag plasmonic nanoparticles and nanoshells on the antireflection coating and the screen-printed fingers of monocrystalline silicon solar cells, respectively, by a single step and scalable modified electroless displacement method. As a consequence, up to 35.2% enhancement in the energy conversion efficiency has been achieved due to the plasmonic broadband light trapping and the significant reduction in the series resistance. More importantly, this method can further increase the efficiency of the best performing textured solar cells from 18.3% to 19.2%, producing the highest efficiency cells exceeding the state-of-the-art efficiency of the standard screen-printed solar cells. The dual functions of the Ag nanostructures, reported for the first time here, present a clear contrast to the previous works, where plasmonic nanostructures were integrated into solar cells to achieve the short-circuit current enhancement predominately. Our method offers a facile, cost-effective and scalable pathway for metallic nanostructures to be used to dramatically boost the overall efficiency of the optically thick crystalline silicon solar cells.

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Section: Resultsmentioning

confidence: 99%

Simultaneous broadband light trapping and fill factor enhancement in crystalline silicon solar cells induced by Ag nanoparticles and nanoshells

Fahim¹,

Jia²,

Shi³

et al. 2012

Opt. Express

View full text Add to dashboard Cite

show abstract

“…Ink technology is continuously improving to keep pace with the evolving printing systems, substrate materials of interest, and potential markets. [72][73][74][75][76] For optimal performance and practical applications, the ink technology has to meet the critical demands of high-resolution printing, long shelf life, low-temperature curing, and green formulation. In addition to functional inks, the substrate selection is critical for the development of a successful device technology meeting the cost and performance demands of the manufacturing technology.…”

Section: Ink Development and Device Applicationsmentioning

confidence: 99%