Inorganic nanofilms for surface charge control on polymer surfaces by atmospheric-pressure plasma deposition

Ostrikov, Kostya

doi:10.1063/1.5008645

Cited by 37 publications

(16 citation statements)

References 59 publications

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“…[ 52 ] It is different from the previous research that the O–C bond is the easiest to break. [ 84,98 ] With the introduction of

{normalO}_{2}

, O replaces Ar(

^{4} S

) as the main reactant for the decomposition of TEOS. In reaction Si

{({OC}_{2} H_{5})}_{4}

+ O

\to

Si(

{OC}_{2} {normalH}_{5}

)OH +

{CH}_{3}

CHO, the O–C bond is broken and the –

{OC}_{2} {normalH}_{5}

is replaced by a hydroxyl (–OH).…”

Section: Resultsmentioning

confidence: 99%

Numerical modeling of gas‐phase reactions of tetraethoxysilane/O2/Ar atmospheric dielectric barrier discharge for deposition

Chang

Dai

Kong

et al. 2023

Plasma Processes & Polymers

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A chemical kinetic model is developed to study the decomposition of tetraethoxysilane (TEOS) in O2/Ar atmospheric pressure dielectric barrier discharge and compared with gas chromatography and optical emission spectroscopy results. The calculations indicate that the excited Ar dominates the fragmentation of TEOS in the absence of oxygen and mainly breaks the carbon–carbon bonds in TEOS. However, in the presence of oxygen, the primary decomposition process of TEOS is the substitution of ethoxy (–OC2H5) by hydroxyl (–OH). The variation of these two reactions with oxygen composition could explain the transition of the deposition layer from organic to norganic. The model and its results provide a theoretical basis for further modeling and regulating the quality of the deposition layer.

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“…[ 52 ] It is different from the previous research that the O–C bond is the easiest to break. [ 84,98 ] With the introduction of

{normalO}_{2}

, O replaces Ar(

^{4} S

) as the main reactant for the decomposition of TEOS. In reaction Si

{({OC}_{2} H_{5})}_{4}

+ O

\to

Si(

{OC}_{2} {normalH}_{5}

)OH +

{CH}_{3}

CHO, the O–C bond is broken and the –

{OC}_{2} {normalH}_{5}

is replaced by a hydroxyl (–OH).…”

Section: Resultsmentioning

confidence: 99%

Numerical modeling of gas‐phase reactions of tetraethoxysilane/O2/Ar atmospheric dielectric barrier discharge for deposition

Chang

Dai

Kong

et al. 2023

Plasma Processes & Polymers

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“…As a consequence, F β increased with the increase of the treatment voltage and approached 80% at the highest treatment voltage of 24 kV. The electroactive phases of PVDF are known to form crystalline lamellar structures in a few orders of nanometers, which were embedded within the amorphous region [44].…”

Section: Characterization Of the Functionalized Batiomentioning

confidence: 99%

Improvement of β-phase crystal formation in a BaTiO₃-modified PVDF membrane

Shen

Gong

Chen

et al. 2018

Plasma Sci. Technol.

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In this paper, low temperature plasma is used to modify the surface of barium titanate (BaTiO 3) nanoparticles in order to enhance the interfacial compatibility between ferroelectric poly (vinylidene fluoride) (PVDF) and BaTiO 3 nanoparticles. The results demonstrate that oxygenic groups are successfully attached to the BaTiO 3 surface, and the quantity of the functional groups increases with the treatment voltage. Furthermore, the effect of modified BaTiO 3 nanoparticles on the morphology and crystal structure of the PVDF/BaTiO 3 membrane is investigated. The results reveal that the dispersion of BaTiO 3 nanoparticles in the PVDF matrix was greatly improved due to the modification of the BaTiO 3 nanoparticles by air plasma. It is worth noting that the formation of a β-phase in a PVDF/modified BaTiO 3 membrane is observably promoted, which results from the strong interaction between PVDF chains and oxygenic groups fixed on the BaTiO 3 surface and the better dispersion of BaTiO 3 nanoparticles in the PVDF matrix. Besides, the PVDF/modified BaTiO 3 membrane at the treatment voltage of 24 kV exhibits a lower water contact angle (≈68.4°) compared with the unmodified one (≈86.7°). Meanwhile, the dielectric constant of PVDF/BaTiO 3 nanocomposites increases with the increase of working voltage.

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“…After plasma deposition for 10 min, the roughness of epoxy resin surface was reduced to the minimum. The surface potential was reduced by 12%, and the surface flashover voltage of epoxy resin increased from 6.54 kV before treatment to 9.28 kV, an increase of [6] . Yu et al deposited chromium oxide film on the surface of alumina ceramics, which increased the flashover voltage in the vacuum by 26%.…”

Section: Introductionmentioning

confidence: 98%

Effects of plasma treatment on surface insulation properties of epoxy composites

He,

2023

J. Phys.: Conf. Ser.

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The surface of epoxy composite material working in DC electric field for a long time is easy to accumulate charge and cause flashover, which seriously reduces its insulation level and poses a threat to the safe operation of electrical equipment. In this study, SiO x films were deposited on the surface of nano-SiO2/ER nanoparticles by atmospheric pressure dielectric barrier discharge plasma vapor deposition technology using ethyl nor-silicate as a precursor. The effects of different deposition time on the deposition effect and the pressure level of the film surface were studied. Scanning electron microscope and atomic force microscope were used to characterize the surface morphology of the material, and the flashover voltage before and after deposition was measured. The results show that SiO x films of different thicknesses can be formed on the surface of the material at different times of plasma deposition. After extending the deposition time of the film, the film becomes more uniform and dense, the surface roughness of the material decreases continuously, and the electrical conductivity and flashover voltage along the surface increases continuously. After 10 min plasma treatment, the conductivity increased from 1.78×10−16 S to 2.3×10−13 S, while the flashover voltage along the surface increased from 19.29 kV to 22.66 kV, an increase of about 17.5%.

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Inorganic nanofilms for surface charge control on polymer surfaces by atmospheric-pressure plasma deposition

Cited by 37 publications

References 59 publications

Numerical modeling of gas‐phase reactions of tetraethoxysilane/O2/Ar atmospheric dielectric barrier discharge for deposition

Numerical modeling of gas‐phase reactions of tetraethoxysilane/O2/Ar atmospheric dielectric barrier discharge for deposition

Improvement of β-phase crystal formation in a BaTiO₃-modified PVDF membrane

Effects of plasma treatment on surface insulation properties of epoxy composites

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Inorganic nanofilms for surface charge control on polymer surfaces by atmospheric-pressure plasma deposition

Cited by 37 publications

References 59 publications

Numerical modeling of gas‐phase reactions of tetraethoxysilane/O2/Ar atmospheric dielectric barrier discharge for deposition

Numerical modeling of gas‐phase reactions of tetraethoxysilane/O2/Ar atmospheric dielectric barrier discharge for deposition

Improvement of β-phase crystal formation in a BaTiO3-modified PVDF membrane

Effects of plasma treatment on surface insulation properties of epoxy composites

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Product

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Improvement of β-phase crystal formation in a BaTiO₃-modified PVDF membrane