Admittance spectroscopy measurements on metal-insulator-semiconductor (MIS) devices allow the determination of electronic states at the insulator/semiconductor interface. The contribution of the ac conductance on the measurements allows the calculation of the interface traps density and the relevant time constant. The experimental data can be analysed using either a model based on the Shockley-Read-Hall (SRH) recombination statistics or via the tunnelling process and recent results allowed both descriptions to be applied on various insulator/semiconductor structures. In the present investigation, the interface states for several MIS devices on a variety of thin film insulators deposited on Si substrates were studied. These devices included structures such as a-C/Si, a-C:H/Si, CN/Si and BaTiO 3 /Si. Admittance spectroscopy took place and the SRH-based models as well as the tunnelling-based models were used to analyse the data. The results showed that the two models could produce equivalent results if a contribution of a continuum of states following the SRH statistics is being included in the tunnelling model.