Radical-mediated thiol-epoxy reactions were elucidated
for analyzing
the overlap problem of the thiol–ene/thiol–epoxy systems
using computational approaches. Nine epoxy model molecules were evaluated
to mimic the chemical structures and reactivity of some industrial
epoxy molecules. Modeling reaction mechanisms was conducted through
density functional theory (DFT) calculations using the M06-2X/6-31+G(d,p)
level at 1.0 atm and 298.15 K. An analog thiol–ene mechanism
was proposed for radical-mediated thiol–epoxide reactions.
Unlike the thiol–ene reactions, the addition reaction to epoxides
is relatively slow (rate constants <10–4 M–1 s–1). However, the chain transfer,
which paves the way for the overlapping of dual curing systems, is
quite fast (rate constants >101 M–1 s–1). High stability of thiyl radicals, epoxy
ring strain,
and the instability of formed alkoxy radical from addition reaction
were emphasized as the main driving forces for the reaction energetics
and kinetics. Control of temperature and using certain thiols are
strongly recommended to avoid curing step overlap based on the findings
in this study.