2009
DOI: 10.1103/physrevb.79.125411
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Insights into few-layer epitaxial graphene growth on4H-SiC(0001¯)substrates from STM studies

Abstract: Epitaxial carbon was grown by heating ͑0001͒ silicon carbide ͑SiC͒ to high temperatures ͑1450-1600°C͒ in vacuum. A continuous graphene surface layer was formed at temperatures above 1475°C. X-ray photoelectron spectroscopy ͑XPS͒ and scanning tunneling microscopy ͑STM͒ were extensively used to characterize the quality of the few-layer graphene ͑FLG͒ surface. The XPS studies were useful in confirming the graphitic composition and measuring the thickness of the FLG samples. STM studies revealed a wide variety of … Show more

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Cited by 225 publications
(170 citation statements)
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“…16 Graphene growth was carried out at 1300 C to 1400 C in vacuum after an initial in-situ surface preparation of the substrates in a hydrogen/silane background. One of the samples was then intercalated in hydrogen at a temperature (pressure) of 800 C (500 mbar) in order to obtain quasi-free standing graphene.…”
mentioning
confidence: 99%
“…16 Graphene growth was carried out at 1300 C to 1400 C in vacuum after an initial in-situ surface preparation of the substrates in a hydrogen/silane background. One of the samples was then intercalated in hydrogen at a temperature (pressure) of 800 C (500 mbar) in order to obtain quasi-free standing graphene.…”
mentioning
confidence: 99%
“…The essential electronic properties can be drastically changed by the layer number [35][36][37], stacking configuration [37][38][39][40][41][42], magnetic field [43,44], electric field [45][46][47], dopping [48,49], mechanical strain [50][51][52], and temperature variation [53,54]. Few-and multi-layer graphenes have been successfully produced by experimental methods such as exfoliation of highly orientated pyrolytic graphite [55][56][57][58], metalorganic chemical vapour deposition (MOCVD) [61][62][63][64][65][66], chemical and electrochemical reduction of graphene oxide [67][68][69], and arc discharge [70,71]. There exist important stacking configurations, including AAB [57,58,69], ABC [59,60,[66][67][68][69], AAA …”
Section: Introductionmentioning
confidence: 99%
“…Few-and multi-layer graphenes have been successfully produced by experimental methods such as exfoliation of highly orientated pyrolytic graphite [55][56][57][58], metalorganic chemical vapour deposition (MOCVD) [61][62][63][64][65][66], chemical and electrochemical reduction of graphene oxide [67][68][69], and arc discharge [70,71]. There exist important stacking configurations, including AAB [57,58,69], ABC [59,60,[66][67][68][69], AAA [62,63], ABA [60,61,66,69], and twisted [62,69] and turbostratic ones [64]. The interlayer atomic interactions and stacking configurations induce the rich electronic properties of graphene.…”
Section: Introductionmentioning
confidence: 99%
“…At growth temperatures ≥ 1550 o C, several-micron large regions of smooth graphene films are obtained with tens of nanometers high ridges as domain boundaries. 16 Without gate stacks, the multi-layer graphene films on C-face are mostly p-type with a typical Hall mobility of 5000-6000 cm 2 /Vs. On Si face, continuous few-layer graphene only starts to form at 1550 o C. The growth on Si-face is much slower, making it possible to form single layer graphene with a better controlled process.…”
mentioning
confidence: 99%