Insights into the low‐temperature deposition of a dense anatase TiO₂ film via an atmospheric pressure pulse‐modulated plasma

Abstract

A pulse-modulated atmospheric pressure radio frequency (RF) plasma is used to prepare a dense TiO 2 thin film at a low temperature. With certain plasma on time (T on = 50 ms), the discharge temperature decreases with plasma off time (T off ), and the lengths of the thin films increase. An anatase TiO 2 thin film was successfully deposited on a temperature-sensitive substrate (polyethylene terephthalate). The transmission electron microscope (TEM) results show that the film is composed from anatase TiO 2 nanoparticles grown through plasma in 0.07 s. By using laser light scattering, the TiO 2 particles are found to be trapped above the substrate at about 0.27 mm during plasma on, which is close to the simulated plasma sheath thickness (0.26 mm). The deposition mechanism of pulse-modulated atmospheric pressure RF plasma has been investigated.

The Facile Construction of Anatase Titanium Dioxide Single Crystal Sheet-Connected Film with Observable Strong White Photoluminescence

“…Cl − plays an important role in promoting the {001} facets of TiO 2 [18]. The plasma sheath will repel negatively charged ions or particles, causing them to be unable to reach the surface of the substrate and participate in chemical reactions [19]. In the "in-glow" region, the sheath is strong, but in the after-glow region, the sheath is weak.…”

An ultraviolet photodetector based on conductive hydrogenated TiO2 film prepared by radio frequency atmospheric pressure plasma

“…A white pristine TiO 2 film was obtained on the substrate after 30 min. More detail of TiO 2 thin films deposition experiment can be found in our previous works [38].…”