2011
DOI: 10.2320/matertrans.m2011062
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Instantaneous and Complete Decomposition of Formaldehyde by Thermally Activated Oxide Semiconductors

Abstract: The extensive use of resin-bonded wood in construction as well as the continued expanding application of formaldehyde-based resins has resulted in formaldehyde (FA) becoming a major indoor contaminant. In this investigation, instantaneous and complete decomposition of FA has been studied by thermally activated semiconductors whose system had previously been developed by us. Complete decomposition has been achieved with Cr 2 O 3 at about 500 C for FA concentrations of 100 and 1200 ppm with a residence time of a… Show more

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Cited by 10 publications
(3 citation statements)
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“…4 which shows complete elimination of formaldehyde (so to speak formalin) for concentrations of 200 and 2000 ppm. 16) The experiment was performed at 500°C in air. The reaction time was calculated to be about 20 ms. Formaldehyde is extremely toxic and is classified as a cancer-causing substance.…”
Section: Introductionmentioning
confidence: 99%
“…4 which shows complete elimination of formaldehyde (so to speak formalin) for concentrations of 200 and 2000 ppm. 16) The experiment was performed at 500°C in air. The reaction time was calculated to be about 20 ms. Formaldehyde is extremely toxic and is classified as a cancer-causing substance.…”
Section: Introductionmentioning
confidence: 99%
“…[6][7][8][9][10][11][12][13][14][15][16][17][18][19][20][21][22] This novel technology developed by us has mainly been used for complete decomposition of thermoplastic or thermosetting polymers, as well as volatile organic compounds (VOCs). However, this technology has never been tested so far for the recovery of glass fibers from FRPs.…”
Section: Introductionmentioning
confidence: 99%
“…6,7) In view of the above situation, an attempt has been made in the present investigation to apply our novel technology to the present problem, utilizing thermally generated holes in semiconductors. [8][9][10][11][12][13][14][15][16][17][18][19][20][21][22][23] The use of thermally activated holes for removal of VOC and organic wastes is an entirely new technology initiated by us in 2001. 8) The present technology uses the formation of a large number of highly oxidative holes generated by thermal excitation of semiconductors.…”
Section: Introductionmentioning
confidence: 99%