10th Annual IEEE/SEMI. Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 99 Proceedings (Cat. No.99CH36295)
DOI: 10.1109/asmc.1999.798302
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Integrated downstream solutions for TEOS silicon dioxide LPCVD system

Youfan Gu1,
Pablo Dozoretz2,
J. Bhakta3
et al.
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