2012
DOI: 10.1134/s1063784212100180
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Integrated evaluation of diffraction image quality in optical lithography using the rigorous diffraction solution for a slot

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Cited by 3 publications
(2 citation statements)
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“…2 and 3), which is caused by scattering on the edges [7,10]. Such divergence can be evaluated by a scalar parameter C div [10], which is determined as a ratio of effective width of field energy spatial distribution at a given distance from a screen x = const to the slot width, i.e., as increase of the width of a slot diffraction image at a given distance x with respect to the width of an aperture, creating this image. Fig.…”
Section: Basic Theory and Results Of Computationsmentioning
confidence: 99%
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“…2 and 3), which is caused by scattering on the edges [7,10]. Such divergence can be evaluated by a scalar parameter C div [10], which is determined as a ratio of effective width of field energy spatial distribution at a given distance from a screen x = const to the slot width, i.e., as increase of the width of a slot diffraction image at a given distance x with respect to the width of an aperture, creating this image. Fig.…”
Section: Basic Theory and Results Of Computationsmentioning
confidence: 99%
“…Fig. 5 demonstrates the computation results for the parameter of slot image divergence in dependence of its width, which have been obtained according to the method described in [10], for the distance x = 4.0λ. Here, one can see very great value of divergence, which is proper to very narrow slot.…”
Section: Basic Theory and Results Of Computationsmentioning
confidence: 99%