Integrated on-chip solid state capacitor based on vertically aligned carbon nanofibers, grown using a CMOS temperature compatible process

Saleem, Amin M; Andersson, Rickard; Desmaris, Vincent; Enoksson, Peter

doi:10.1016/j.sse.2017.10.037

Cited by 11 publications

(6 citation statements)

References 13 publications

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“…The total active material area on both the planar interdigitated electrodes combined was 0.81 cm −2 . The estimation of volume are observed further in Vyas et al [ 13 ] and Saleem et al [ 17 ]…”

Section: Methodsmentioning

confidence: 76%

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Comparison of Thermally Grown Carbon Nanofiber‐Based and Reduced Graphene Oxide‐Based CMOS‐Compatible Microsupercapacitors

Vyas

Hajibagher

et al. 2020

Physica Status Solidi (b)

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Microsupercapacitors as miniature energy storage devices require complementary metal–oxide–semiconductor (CMOS) compatible techniques for electrode deposition to be integrated in wireless sensor network sensor systems. Among several processing techniques, chemical vapor deposition (CVD) and spin coating, present in CMOS manufacturing facilities, are the two most viable processes for electrode growth and deposition, respectively. To make an argument for choosing either of these techniques to fabricate MSCs utilizable for an on‐chip power supply, we need a comparative assessment of their electrochemical performance. Herein, the evaluation of MSCs with CVD‐grown carbon nanofiber (CNF)‐based and spin‐coated reduced graphene oxide (rGO)‐based electrodes is reported. The devices are compared for their capacitance, energy and power density, charge retention, characteristic frequencies, and ease of fabrication over a large sweep of scan rates, current densities, and frequencies. The rGO‐based MSCs demonstrate 112 μF cm−2 at 100 mV s−1 and a power density of 12.8 mW cm−2. The CNF‐based MSCs show 269.7 μF cm−2 and 30.8 mW cm−2. CVD‐grown CNF outperforms spin‐coated rGO in capacitive storage at low frequencies, whereas the latter is better in terms of charge retention and high‐frequency capacitance response.

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Section: Methodsmentioning

confidence: 76%

“…The details of the catalysis process were described thoroughly by Desmaris and coworkers. [ 17 ] The CNF was grown at 390 °C in a mixture of acetylene and ammonia (Figure 1a(iii)). Figure 1h shows the scanning electron micrograph of the material.…”

Section: Methodsmentioning

confidence: 99%

Comparison of Thermally Grown Carbon Nanofiber‐Based and Reduced Graphene Oxide‐Based CMOS‐Compatible Microsupercapacitors

Vyas

Hajibagher

et al. 2020

Physica Status Solidi (b)

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“…Numerous applications including capacitors [1][2][3] , catalysts [4][5][6] , and batteries [7][8][9] can benefit from the deposition of thin films on high aspect ratio or nanostructured substrates. Atomic layer deposition (ALD) 10 allows a wide variety of materials to be deposited on high aspect ratio structures at relatively low temperatures with excellent control over film thickness.…”

Section: Introductionmentioning

confidence: 99%

Penetration depth variation in atomic layer deposition on multiwalled carbon nanotube forests

Kane

Davis

Vanfleet

2019

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Atomic layer deposition (ALD) of Al2O3 on tall multiwalled carbon nanotube forests shows concentration variation with depth in discrete steps. While ALD is capable of extremely conformal deposition in high aspect ratio structures, decreasing penetration depth has been observed over multiple thermal ALD cycles on 1.3 mm tall multiwalled carbon nanotube forests. Scanning electron microscopy imaging with energy dispersive x-ray spectroscopy elemental analysis shows steps of decreasing intensity corresponding to decreasing concentrations of Al2O3. A study of these steps suggests that they are produced by a combination of diffusion limited precursor delivery and the increase in precursor adsorption site density due to nuclei growing during the ALD process. This conceptual model has been applied to modify literature models for ALD penetration on high aspect ratio structures, allowing two parameters to be extracted from the experimental data. The Knudsen diffusion constant for trimethylaluminum (TMA) in these carbon nanotube forests has been found to be 0.3 cm2 s−1. From the profile of the Al2O3 concentration, the sticking coefficient of TMA in the TMA/water thermal ALD process was found to be 0.003.

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“…The growth mechanism of CNF relies on the de-wetting of metal catalyst droplets under proper adequate plasma conditions. Details on the mechanisms and resulting structures can be found in Desmaris et al 25 and the analysis of typical CNFs grown under the same conditions have been reported in Saleem et al 26 The CNFs are grown onto these nanoparticles at temperatures of 390 C and 550 C at varying times for a growth of 3 mm, 5 mm, 8 mm, 12 mm and 14 mm (estimated using Veeco Dektak Proler) using a mixture of acetylene and ammonia in direct current plasma enhanced CVD ( Fig. 1(a-iii)).…”

mentioning

confidence: 99%

“…4(c) is another representation of the maximum capacitance exhibited by the MSC devices over the total active electrode area. The active electrode area for CNFbased MSC was previously evaluated by Saleem et al 25 The total surface area of a collection of CNFs can be calculated by N(2prl + pr 2 ); where N is the approximate number of CNF bers in a given area, r is the radius of a single CNF ber approximated as 100 nm, and l is the length of the CNF grown on the substrate. In the gure, the maximum capacitance of the CNF displays a constant capacity despite increasing CNF lengths beyond 12 mm.…”

mentioning

confidence: 99%

Impact of electrode geometry and thickness on planar on-chip microsupercapacitors

Vyas

Wang

et al. 2020

RSC Adv.

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Integrated on-chip solid state capacitor based on vertically aligned carbon nanofibers, grown using a CMOS temperature compatible process

Cited by 11 publications

References 13 publications

Comparison of Thermally Grown Carbon Nanofiber‐Based and Reduced Graphene Oxide‐Based CMOS‐Compatible Microsupercapacitors

Comparison of Thermally Grown Carbon Nanofiber‐Based and Reduced Graphene Oxide‐Based CMOS‐Compatible Microsupercapacitors

Penetration depth variation in atomic layer deposition on multiwalled carbon nanotube forests

Impact of electrode geometry and thickness on planar on-chip microsupercapacitors

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