Advanced Microwave Circuits and Systems 2010
DOI: 10.5772/8418
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Integrated Passives for High-Frequency Applications

Abstract: Introduction 1.1 Definitions of Integrated Passives Passive elements are indispensable in RF systems and are used for matching networks, LC tank circuits, attenuators, filtering, decoupling purposes and so on (Tilmans H. A C et al., 2003). Passive elements can be simply classified into distributed elements including transmission lines and waveguides, and lumped elements including inductors, capacitors and resistors. The distributed circuits take into account the phase shift occurring when the signal wave propa… Show more

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Cited by 15 publications
(8 citation statements)
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“…Such results can be explained by the mismatch of the Thermal Coefficient Expansion (TCE) between capacitor material on the one hand (BST 10.5 ppm/K and Pt 8.8 ppm/K) and silicon substrate on the other hand (2.5 ppm/K), which is much less significant difference considering sapphire substrate (6 ppm/K) [16].…”
Section: Substrate Changementioning
confidence: 96%
“…Such results can be explained by the mismatch of the Thermal Coefficient Expansion (TCE) between capacitor material on the one hand (BST 10.5 ppm/K and Pt 8.8 ppm/K) and silicon substrate on the other hand (2.5 ppm/K), which is much less significant difference considering sapphire substrate (6 ppm/K) [16].…”
Section: Substrate Changementioning
confidence: 96%
“…It is a multistage plating technology based on a sacrifice layer to increase the quality factor and reduce the parasitic capacitance [2,6]. The fabricated two-layered aerial spiral coil is shown in Fig.…”
Section: Miniaturized Duplexer Modulementioning
confidence: 99%
“…To minimize and reduce the risks of losses, the silicon substrate used was 305 μm thick high resistivity MCZ silicon wafers (3-10 kΩ-cm) from Okmetic Oyj. If regular CZ Si-wafers had been used with low resistivity (≦100 Ω-cm), the magnetic fields would penetrate deeply into the substrate causing losses and reducing both the inductance and Q-factor [8], and be a lossy medium for RF signals [9]. The purpose to use thin Siwafers is to be able integrate the magnetic process flow with Silex established Cu-metalized TSV process flow [2], which requires 305 µm wafers.…”
Section: Fabricationmentioning
confidence: 99%