1986
DOI: 10.1021/ac00294a004
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Intelligent, automatic compensation of solution resistance

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Cited by 105 publications
(78 citation statements)
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“…The uncompensated solution resistance was determined using a method developed by He and Faulkner. 17 . This parameter was specifically considered in the Tafel plot measurements, where the data is presented in iR compensated form.…”
Section: Methodsmentioning
confidence: 99%
“…The uncompensated solution resistance was determined using a method developed by He and Faulkner. 17 . This parameter was specifically considered in the Tafel plot measurements, where the data is presented in iR compensated form.…”
Section: Methodsmentioning
confidence: 99%
“…The usual feedback loop for the RE contains a voltage follower. 16 The latter matches the high impedance of the RE to the impedance (typically ¾2 K ) of a summing network, and prevents any currents from flowing through the RE. Detailed discussion of these potentiostats can be found in the literature.…”
Section: Considerations Of Instrumental Factorsmentioning
confidence: 97%
“…In an earlier report, He and Faulkner noted that the frequency response of the cell to a PS approaches the ideal response for infinite bandwidth, with an exponential decay of the frequency amplitude envelope. 16 Thus, in the context of PS experiments it is necessary to consider a frequency (ω)-dependent complex impedance Z W for the WE, as is usually done in electrochemical impedance spectroscopy(EIS). 14,18 When the applied voltage is stepped from E ei to E ef , the available input current to the cell, i in , has the form…”
Section: Considerations Of Instrumental Factorsmentioning
confidence: 99%
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“…Among the latest instrumental methods is intelligent, automatic compensation of solution resistance by means of a cybernetic potentiostat (ref. 23). In this way cyclic voltammetry of ferrocene in methylene chloride (pernittivity = 9) with 0.1 M tetrabutylamnoniun tetrafluoroborate as supporting electrolyte could be much improved, with the anodic-to-cathodic peak separation decreasing from 224 mV with no compensation to 59 mV (as expected for a reversible one-electron process) with full compensation.…”
Section: Microelectrodesmentioning
confidence: 89%