2019
DOI: 10.1016/j.tsf.2019.02.020
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Intense pulsed light sintering of Cu nano particles/micro particles-ink assisted with heating and vacuum holding of substrate for warpage free printed electronic circuit

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Cited by 30 publications
(18 citation statements)
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“…The short synthesis time of 3 min indicates that microwave‐assisted Cu synthesis is a method applicable to a continuous flow microwave‐assisted reactor for industrial production [41]. The non‐aggregated Cu particles smaller than 100 nm can be applicable as a low‐cost filler material for the fabrication of electrode or conduction patterns by intense pulsed light sintering [42–44] as well as sinter chip‐bonding [31–33].…”
Section: Resultsmentioning
confidence: 99%
“…The short synthesis time of 3 min indicates that microwave‐assisted Cu synthesis is a method applicable to a continuous flow microwave‐assisted reactor for industrial production [41]. The non‐aggregated Cu particles smaller than 100 nm can be applicable as a low‐cost filler material for the fabrication of electrode or conduction patterns by intense pulsed light sintering [42–44] as well as sinter chip‐bonding [31–33].…”
Section: Resultsmentioning
confidence: 99%
“…Several groups utilized mixed Cu pastes with different sizes for the IPL sintering process in the air [ 126 , 127 , 128 , 129 , 130 ]. In the IPL sintering process, Cu nanoparticle inks often face two problems: (i) the crack formation from the volume shrinkage under tensile stress on a flat substrate and (ii) the thickness limitation of fewer than 5 μm due to the high absorption efficiency of Cu nanoparticles.…”
Section: Formulation Designs In Cu-based Mixed Inks/pastesmentioning
confidence: 99%
“…Ryu et al demonstrated the optimal IPL-sintered Cu nano/microparticle (CuNP/MP) film using the vacuum pressure for substrate holding, 150 °C substrate heating, and irradiation energy, 3.5 J/cm 2 ( Figure 15 d) [ 127 ]. The IPL-sintered Cu film had a low resistivity of 6.94 μΩ·cm and 5B level of adhesion strength with almost no warpage of the PI substrate ( Figure 15 e,f).…”
Section: Formulation Designs In Cu-based Mixed Inks/pastesmentioning
confidence: 99%
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“…However, by using ink formulations that necessitate high sintering energies to maximize conductive performance, the direct underlying substrate can experience damage due to poor localized heat dissipation at the cured metallic ink and substrate interface. [13,26] As a result, careful control over the process is required, and a need for a wider processing window has been identified.…”
Section: Introductionmentioning
confidence: 99%