Large Wolter mirrors fabricated by high-precision Ni electroforming process have been used for X-ray telescopes. Since the replication accuracy of these mirrors is on the order of 100 nm, the surface figure correction is necessary for improving the figure accuracy. Recently, we have proposed a new figure correction scheme utilizing a Si layer on the mirror surface. The thickness of Si film can be measured with accuracy at a 1 nm level by a thickness measurement gauge, and Si removal process will be applied so that the figure error is reduced. In this study, we developed the DC magnetron sputtering system especially for depositing a Si on the inner surface of the Wolter mirror. By optimizing the parameters such as Ar gas pressure and the sputter power, we demonstrated a coating of uniform Si layer on the Wolter mirror. The uniform Si layer with a thickness of 90 nm was successfully produced with an accuracy of ±10 nm in PV(Peak-to-Valley). The uniformity of the deposition using this method was 10 nm of PV(Peak-to-Valley).