2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology 2012
DOI: 10.1109/icsict.2012.6467753
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Inter-CMOS process for monolithic integrated MEMS resonator

Abstract: In this work, novel processes for the simultaneous fabrication of the MEMS (micro electro mechanical system) and CMOS (complementary metal oxide semiconductor) components on a monolithic integrated micro-cantilever resonator are proposed. A universal cavity shared by the entire MEMS unit is designed, which decreases the altitude difference between the MEMS and CMOS parts,thus benefiting the subsequent lithography for metal interconnection. The substrate for the CMOS unit is independent on the MEMS unit, assuri… Show more

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Cited by 4 publications
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