2012
DOI: 10.1016/j.physb.2011.08.064
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Interaction of dopant atoms with stacking faults in silicon

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Cited by 8 publications
(2 citation statements)
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“…Shunt resistance and FF, however, are not decreased after PID in the n‐type solar cell, and it can be argued that the stacking faults in the emitter of the n‐type solar cells are not active after PID. From a study of the interaction energy between the silicon doping type and the stacking faults, this phenomenon can be interpreted by the relationship between the dopant in the silicon and the stacking faults . P‐type and n‐type dopants show (−) charges and (+) charges after they are activated in the silicon, respectively.…”
Section: Resultsmentioning
confidence: 99%
“…Shunt resistance and FF, however, are not decreased after PID in the n‐type solar cell, and it can be argued that the stacking faults in the emitter of the n‐type solar cells are not active after PID. From a study of the interaction energy between the silicon doping type and the stacking faults, this phenomenon can be interpreted by the relationship between the dopant in the silicon and the stacking faults . P‐type and n‐type dopants show (−) charges and (+) charges after they are activated in the silicon, respectively.…”
Section: Resultsmentioning
confidence: 99%
“…[ 51,55,60 ] Moreover, on p ‐doped areas, the interaction of boron with Si SF would be too weak to sufficiently reduce the Si SF energy and allow the Na + penetration according to theoretical considerations. [ 143,144 ] The third degradation mechanism happens after 96 h and has been further classified in PID‐c by the same authors. [ 67 ] It is characterized by another FF and V oc decrease with a J 02 , n 2 , and 1000 / R sh increase.…”
Section: Pid In Bifacial Pv Modules: Degradation Mechanisms and Recov...mentioning
confidence: 99%