Abstract:As an adhesion layer between Au nanoparticles (NPs) and a SiO 2 /Si(100) substrate, a TiO 2 film was formed on SiO 2 /Si(100) by Ti deposition in O 2 at 1 ' 10 %6 Torr with a slow deposition rate (0.16 nm/min). The Ti 2p core-level spectra were measured for the film, and only peaks from the Ti atoms in the oxidation state of 4+ were observed, indicating that the TiO 2 film was highly stoichiometric. An atomic force microscopy (AFM) study showed that the surface roughness (rms) of the film was about 0.3 nm. Au … Show more
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