1996
DOI: 10.1016/0039-6028(95)01060-2
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Interaction of H with epitaxial Er silicide layers on Si(111): adsorption versus absorption

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Cited by 13 publications
(9 citation statements)
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“…1 (a). In previous angle-resolved photoemission (ARP) [6] and high-resolution electron energy loss spectroscopy (HREELS) [7] studies of hydrogen chemisorption on ErSi 2 , we have found that H is adsorbed in Si surface and Er subsurface sites. These two sites correspond to the saturation of the available dangling bonds of the silicide buckled Si top layer leading to the formation of a monohydride phase similar to the Si(111)-(1 × 1) H surface, and to Er-H bonds apparently related to interstitial sites of the hexagonal Er monolayer in a way that reminds rare-earth hydrides, respectively.…”
mentioning
confidence: 94%
“…1 (a). In previous angle-resolved photoemission (ARP) [6] and high-resolution electron energy loss spectroscopy (HREELS) [7] studies of hydrogen chemisorption on ErSi 2 , we have found that H is adsorbed in Si surface and Er subsurface sites. These two sites correspond to the saturation of the available dangling bonds of the silicide buckled Si top layer leading to the formation of a monohydride phase similar to the Si(111)-(1 × 1) H surface, and to Er-H bonds apparently related to interstitial sites of the hexagonal Er monolayer in a way that reminds rare-earth hydrides, respectively.…”
mentioning
confidence: 94%
“…This peak at 0.9 eV is similar in energy to a feature noted by Saintenoy et al resulting from the 3p z electrons in vacancies. 31 This would explain its absence from the 2D spectra.…”
Section: A Upsmentioning
confidence: 96%
“…31 In the 1 ML spectrum, the peak labeled as a is thought to be a superposition of two features: both a Si surface feature and a Ho feature. The surface feature previously noted by Saintenoy et al 31 at −0.1 eV relative to E F has been explained as a Si surface state from p z dangling bonds. A large emission is also expected to arise from the Ho 5d emission at E F .…”
Section: A Upsmentioning
confidence: 99%
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“…In the specific case of rare-earth ͑RE͒ metals on silicon, technological interest arises from the fact that RE silicides on silicon have been found to have unusual Schottky barrier heights of 0.3-0.4 eV for n-Si and 0.7-0.8 eV for p-Si. 1,2 Furthermore, from a fundamental point of view, the Er/Si͑111͒ surface is of interest due its unusual feature of forming a two-dimensional ͑2D͒ silicide layer on top of Si͑111͒ for an Er coverage of 1 monolayer ͑ML͒, [3][4][5][6][7][8][9][10][11] characterized by a 1ϫ1 low-energy electron diffraction ͑LEED͒ pattern. Such 2D silicides have also been suggested for the Ho/Si͑111͒ and Dy/Si͑111͒ surfaces 12 and appear to be unique to trivalent rare-earth metals.…”
Section: Introductionmentioning
confidence: 99%