, and Lu͒ have been prepared by cosputtering. The films were investigated in detail by x-ray photoelectron spectroscopy employing 1486.6 eV photons. Additional information was also achieved by optical techniques and ion beam analyses. As a result of the deposition method and conditions, the films present similar contents of Si and N, and rare-earth concentrations below 1.0 at. %. In spite of this relatively low concentration, and taking advantage of the high photoionization cross section of the rare-earth elements at 1486.6 eV, the signal of several different core-levels and Auger transitions could be detected and analyzed. The electronic states at the top of the valence band of the RE-doped a-SiN films were also investigated with 1486.6 eV photons. Compared to the spectroscopic data of pure metals, the RE-related core levels of the present a-SiN films exhibit an energy shift typically in the 0.8-2.5 eV range, which is attributed to the presence of nitrogen atoms. According to the experimental data, most of the RE ions remain in the 3ϩ state. The only clear exception occurs in the Yb-doped a-SiN film, where a large fraction of Yb 2ϩ coexisting with Yb 3ϩ ions is evident.