Electrical and structural properties of Schottky-barrier diodes formed with TiB x and ZrB x amorphous layers on n-6H-, 15R-and 4H-SiC (with epi-layer) were studied. High thermal stability of ideality factors and barrier heights in the formed contacts was explained by the thermal stability of an interface TiB x (ZrB x )-SiC after rapid thermal annealing at 800°Ñ for 60 s.