The properties of MoS2 can be tuned or optimized
through
doping. In particular, Ni doping has been shown to improve the performance
of MoS2 for various applications, including catalysis and
tribology. To enable investigation of Ni-doped MoS2 with
reactive molecular dynamics simulations, we developed a new ReaxFF
force field to describe this material. The force field parameters
were optimized to match a large set of density functional theory (DFT)
calculations of 2H-MoS2 doped with Ni, at four different
sites (Mo-substituted, S-substituted, octahedral intercalation, and
tetrahedral intercalation), under uniaxial, biaxial, triaxial, and
shear strain. The force field was evaluated by comparing ReaxFF- and
DFT-relaxed structural parameters, the tetrahedral/octahedral energy
difference in doped 2H, energies of doped 1H and 1T monolayers, and
doped 2H structures with vacancies. We demonstrated the application
of the force field with reactive simulations of sputtering deposition
and annealing of Ni-doped MoS2 films. Results show that
the developed force field can successfully model the phase transition
of Ni-doped MoS2 from amorphous to crystalline. The newly
developed force field can be used in subsequent investigations to
study the properties and behavior of Ni-doped MoS2 using
reactive molecular dynamics simulations.