“…We prepared the three types of Zn(O,S) buffer layers, cracker-Zn(O,S), CBD-Zn(O,S), and sputter-Zn(O,S), based on reference recipes in our laboratory. The cracker-Zn(O,S) buffer layer was prepared by a two-step process: a Zn film of 3 nm was first deposited on the CIGS layer by the sputtering method with working pressure of 40 W at room temperature and then sulfurized using the S thermal cracker chamber at a substrate temperature of 550 °C for 10 min, resulting in a cracker-Zn(O,S) film of 8 nm. , A CBD-Zn(O,S) buffer layer with a thickness of ∼30 nm was synthesized in an aqueous solution by precipitating the ZnS phase at 85 °C in a homemade water bath system under fixed deposition conditions: a zinc sulfate mole concentration of 0.02 M, thiourea of 0.08 M, and ammonia concentration of 2 M for 45 min. , The 70 nm thick Zn(O,S) layer was deposited by RF sputtering: a ZnS target (4 in.) at RF power of 150 W and a mixture gas (90/10 Ar/O 2 (%)) were introduced simultaneously at a steady total gas flow rate of 100 cm 3 (STP) min –1 at a substrate temperature of 200 °C. , Since we wanted to ensure well-made layers for each Zn(O,S) buffer type in the completed CIGS solar cell, their thicknesses were different.…”