“…Thus, for sparingly soluble F x PcM (M = Co, Cu, Zn, x = 4, 8, 16), physical vapor deposition is the method of choice, while for more soluble fluoroalkyl- and fluoroaryl-substituted PcM, drop cast, spin coating, and jet spray techniques have been reported . Multiple mechanistic and structural studies on the preparation and characterization of thin films of F 16 PcM (M = Zn, Cu, Co, Fe) supported on the surfaces of semiconductors, metals, and metal oxides have been reported. − Prone to aggregation, planar F 16 PcM platform, deposited under high vacuum conditions, produced relatively thick (several nanometers) films with a strong Pc-mineral surface coupling. Considering that the film thickness is essential for designing successful organic semiconductor devices, and the fact that submonolayer films act as a template on which future depositions, multilayer formation, take place, the study of submonolayer film formation and properties is of great interest .…”