2007
DOI: 10.1063/1.2819684
|View full text |Cite
|
Sign up to set email alerts
|

Interface structure and strain relaxation in BaTiO3 thin films grown on GdScO3 and DyScO3 substrates with buried coherent SrRuO3 layer

Abstract: Articles you may be interested in Strain relaxation of epitaxial ( Ba 0.6 Sr 0.4 ) ( Zr 0.3 Ti 0.7 ) O 3 thin films grown on SrTiO 3 substrates by pulsed laser deposition

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

0
21
0

Year Published

2009
2009
2018
2018

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 32 publications
(21 citation statements)
references
References 25 publications
0
21
0
Order By: Relevance
“…When a film exceeds a certain threshold thickness, called the critical thickness, it exhibits lattice relaxation by introducing defects that allow the lattice constants to approach bulk values. [1][2][3][4][5] Many physical properties can be altered by epitaxial strain, including the highly desirable "ferroic" orderings (memory effects), where the interatomic distances can play a crucial role. For example, the transition temperature of ferromagnetic and ferroelectric (FE) ordering can drastically change, as can the magnitude of the associated order parameters.…”
mentioning
confidence: 99%
“…When a film exceeds a certain threshold thickness, called the critical thickness, it exhibits lattice relaxation by introducing defects that allow the lattice constants to approach bulk values. [1][2][3][4][5] Many physical properties can be altered by epitaxial strain, including the highly desirable "ferroic" orderings (memory effects), where the interatomic distances can play a crucial role. For example, the transition temperature of ferromagnetic and ferroelectric (FE) ordering can drastically change, as can the magnitude of the associated order parameters.…”
mentioning
confidence: 99%
“…Eom and co‐workers used these two models to estimate the critical thickness of SrRuO 3 and BaTiO 3 films on DyScO 3 and GdScO 3 substrates, respectively. The energy balance model shows that h c of this system with a 2% mismatch is about 20 nm, and that is about 100 nm for this system with 1% mismatch, as shown in Figure d …”
Section: Mismatch and Strainmentioning
confidence: 83%
“…Films deposited above T s = 450 °C are more insulating, with a monotonic reduction of the leakage current with Ts, presenting the T s = 750 °C samples leakage current below 1x10 -7 A/cm 2 and 4x10 -6 A/cm 2 at 45 and 225 kV/cm, respectively. We emphasize that the leakage of these films is comparable to state of the art BTO films on perovskite single crystalline substrates 5,7 or to thick epitaxial Pb(Zr,Ti)O 3 films on Si(001). 18 The impact of the deposition temperature on the properties of BTO is schematized in Fig.…”
Section: (E)mentioning
confidence: 85%
“…1,2 However, conventional substratebased strain engineering is restricted to relatively small ranges of strain and film thickness due to plastic relaxation. [3][4][5] Moreover, it is based on the selection of a specific substrate, whereas most applications require integration with silicon. Therefore, alternatives to the usual substrate engineering are needed, and some unconventional methods have been already developed.…”
Section: Tailoring Lattice Strain and Ferroelectric Polarization Of Ementioning
confidence: 99%