Interfaces

Abstract

The sections in this article are Introduction Experimental Techniques Interfaces between Lattice‐Matched, Isostructural Systems Definition Structure Microscopic Structure Mesoscopic and Macroscopic Structure Interfaces Defined by Inhomogeneous Doping Relaxation of Chemical Interfaces Interdiffusion due to Thermal Annealing Intermixing due to Ion‐Implantation Summary Interfaces between Lattice‐Mismatched, Isostructural Systems Lattice Mismatch Strain and Relaxation Mechanisms Origin and Magnitude of Lattice Mismatch Strain Strain Accommodation and Relief Mechanisms Epitaxial Layer Roughening Interdiffusion Misfit Dislocations Competition between Different Relaxation Modes The Critical Thickness for Misfit Dislocation Introduction: Excess Stress Basic Concepts: Single Interface Systems Extension to Multilayer Systems Misfit Dislocation Kinetics Kinetic Relaxation Models Nucleation of Misfit Dislocations Propagation of Misfit Dislocations Interactions of Misfit Dislocations Techniques for Reducing Interfacial and Threading Dislocation Densities Electrical Properties of Misfit Dislocations Summary Interfaces between Crystalline Systems Differing in Composition and Structure Introduction Fabrication of Epitaxial Silicide–Silicon Interfaces Monolayers Reaction Interlayer Mediated Epitaxy Growth of Silicon on Silicides Conglomeration of Silicide Precipitates Epitaxial Elemental Metals Epitaxial Metallic Compounds on III – V Semiconductors Structure, Energetics, and Electronic Properties of M – S Interfaces Epitaxial Silicide–Silicon Interfaces Epitaxial Elemental Metals Intermetallic Compounds on III – V Semiconductors Conclusions Interfaces between Crystalline and Amorphous Materials: Dielectrics on Silicon The Si / Si O 2 System Processing The Si / Si O x N y System Alternative Gate Dielectrics Conclusion