2007
DOI: 10.1016/j.susc.2007.05.003
|View full text |Cite
|
Sign up to set email alerts
|

Interfacial behavior of alkyltrichlorosilane monolayers on silicon: Control of flat-band potential and surface state distribution using chain length variation

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

1
18
0

Year Published

2008
2008
2016
2016

Publication Types

Select...
5
1
1

Relationship

0
7

Authors

Journals

citations
Cited by 23 publications
(19 citation statements)
references
References 61 publications
1
18
0
Order By: Relevance
“…The negative shifting in E FB values as TU content increases (see inset in Fig. 1) would suggest that the surface states distribution in the semiconductor is modified by TU adsorption, as previous reported for organic monolayers [46]. Additional evidence is obtained by potentiodynamic experiments in Cu 2+ ions free solutions.…”
Section: Characterization Of N-si(1 1 1)-h Surfacessupporting
confidence: 76%
See 1 more Smart Citation
“…The negative shifting in E FB values as TU content increases (see inset in Fig. 1) would suggest that the surface states distribution in the semiconductor is modified by TU adsorption, as previous reported for organic monolayers [46]. Additional evidence is obtained by potentiodynamic experiments in Cu 2+ ions free solutions.…”
Section: Characterization Of N-si(1 1 1)-h Surfacessupporting
confidence: 76%
“…It is well-known that copper deposition on n-type silicon is an irreversible process, which is due to the Schottky-barrier formed on the semiconductor electrode [14,15,47]. However, the electron transfer from the redox couple to the conduction band of the n-Si(1 1 1) electrode is promoted for a high donor density (N D % 9 Â 10 19 cm À3 ) [45][46][47][48]. During the second potentiodynamic cycle no current is detected in the whole potential range due to the surface passivation by the oxide layer formed.…”
Section: Copper Electrodeposition Onto N-si(1 1 1)-h Surfacesmentioning
confidence: 99%
“…Chlorosilane was very effective for tuning the physical and chemical properties of organic and inorganic materials [13,14]. Until recently, most reports about the modification of inorganic fillers have been focused on the preparation of PV hybrid membranes used for dehydration of organic solvents or gas separation.…”
Section: Introductionmentioning
confidence: 99%
“…[3][4][5][6]). In particular cases experimental results can form a straight line in the Mott-Schottky plot and the line can be used for estimating built-in potential or dopant density (e.g.…”
Section: Introductionmentioning
confidence: 99%