2019
DOI: 10.1016/j.intermet.2018.12.007
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Interfacial layer formation during high-temperature deposition of Sm-Co magnetic thin films on Si (100) substrates

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Cited by 8 publications
(1 citation statement)
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“…[4][5][6] As a result, some critical processes are demanded for the fabrication of sputtered Sm-Co films with higher anisotropy field, such as conventional post-annealing, substrate heating, etc. [7][8][9][10] Whereas it is insufficient to control the direction of magnetic anisotropy and suppress the excessive grain growth due to the high temperature. Peng et al demonstrated that the annealing parameters partially determine the coercivity and rapid recurrent thermal annealing (RRTA) can effectively control the microstructure and magnetic properties.…”
Section: Introductionmentioning
confidence: 99%
“…[4][5][6] As a result, some critical processes are demanded for the fabrication of sputtered Sm-Co films with higher anisotropy field, such as conventional post-annealing, substrate heating, etc. [7][8][9][10] Whereas it is insufficient to control the direction of magnetic anisotropy and suppress the excessive grain growth due to the high temperature. Peng et al demonstrated that the annealing parameters partially determine the coercivity and rapid recurrent thermal annealing (RRTA) can effectively control the microstructure and magnetic properties.…”
Section: Introductionmentioning
confidence: 99%