2018
DOI: 10.1088/1674-4926/39/12/124013
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Interfacial passivation of n-ZnO/p-Si heterojunction by CuI thin layer

Abstract: The ZnO/Si heterojunction diode can be integrated with the Si process, which has attracted great attention in recent years. However, the large number of interface states at the ZnO/ Si heterojunction interface could adversely affect its optoelectronic properties. Here, n-type ZnO thin film was deposited on p-Si substrate for formation of an n-ZnO/p-Si heterojunction substrate. To passivate the ZnO/Si interface, a thin CuI film interface passivation layer was inserted at the ZnO/p-Si heterojunction interface. E… Show more

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Cited by 5 publications
(2 citation statements)
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“…The electron affinity energies (E C and E V ) of these materials are calculated based on previously published experimental results [40]. E g for CuI and ZnO are obtained in this work.…”
Section: Resultsmentioning
confidence: 99%
“…The electron affinity energies (E C and E V ) of these materials are calculated based on previously published experimental results [40]. E g for CuI and ZnO are obtained in this work.…”
Section: Resultsmentioning
confidence: 99%
“…The use of new materials in data storage devices, memory and solar cells is another area of current research. Studies that present the characteristics of new analog memories using gold/zinc dioxide/indium tin oxide (Au/ZnO/ITO) [123] devices, or the analysis of the electron affinity optimization and the band gap of a ZnO/Si [124] heterojunction solar cell. Even though all the devices in development have a higher cost, they are attracting great technological interest [125].…”
Section: Community Analysismentioning
confidence: 99%