Interfacial reaction growth approach to preparing patterned nanomaterials and beyond

Abstract

In conventional template-assisted synthesis, a template is used as a physical confiner to control the morphologies of the prepared materials. However, the template can also initiate interfacial reactions to form various patterned materials at its exposed surfaces. This concept can evolve into a general interfacial reaction growth approach in nanofabrications. In this tutorial review, we describe its fundamental issues, recent progress and achievements, and the properties and applications of the prepared nanomaterials before we summarize and give our personal perspectives.

Gas sensors using ordered macroporous oxide nanostructures

“…It is well known that ordered macroporous metal oxide nanostructures can be prepared by means of several approaches, such as CC hard template, anodized aluminum oxide template, 31,32 and e-beam lithography. 33 Among them, studies have popularly focused upon hard spherical template methods due to their facile, controllable, and cost-effective characteristics.…”

A Ga2O·11Al2O3 nanonet prepared by interfacial reaction growth approach and its application in fabricating GaN nanowires

“…In those fabrication processes, however, there exist disadvantages such as high cost, low efficiency and large amount of time consumption. To improve the fabrication, we have developed a novel approach combining interfacial reaction growth (IRG) [22] and epitaxial growth to produce zinc aluminate and zinc oxide nanonets on a porous anodic aluminum oxide (AAO) template [23][24][25]. This IRG approach has also been applied to prepare metallic Mo and Cu nanonets [26].…”

Fabrication of Large Area, Ordered Nanoporous Structures on Various Substrates for Potential Electro-Optic Applications

“…Therefore, it may not translate to a preferred manufacturing process. Meantime, metal anodization processes, i.e., anodized aluminum oxide (AAO) and anodized titanium oxide (ATO) processes, are used for large-area nanopore templates [11][12][13][14], but their array patterns tend to contain locally disordered portions, which would limit their usage for electronic memory devices or photonic devices requiring perfectly ordered arrays over a large area. Multibeam interference lithography (MIL), however, could be a good candidate for the patterning of perfectly ordered large-area photonic crystals and can be applied for photonic, electronic applications [15][16][17][18][19].…”