Intrinsic anomalous surface roughening of TiN films deposited by reactive sputtering

Auger, M.A.; Vázquez, Luís; Cuerno, Rodolfo; Castro, Mario; Jergel, M.; Sánchez, O.

doi:10.1103/physrevb.73.045436

Cited by 59 publications

(34 citation statements)

References 49 publications

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“…Nevertheless, in this study at AP the system presents an anomalous scaling behaviour although the process is not characterized by a high growth exponent as observed by others [33,34,37,38]. Even though the LDR is varied within the discharge region the fact that the local and spectral roughness exponents are not affected by the LDR may suggest a uniform activation of the precursor within the discharge.…”

Section: Second Order Statisticssupporting

confidence: 40%

Variable roughness development in statically deposited SiO₂ thin films: a spatially resolved surface morphology analysis

Meshkova

Starostin

Sanden

et al. 2018

J. Phys. D: Appl. Phys.

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For the first time a systematic analysis of the growth front evolution of statically deposited silica films in an atmospheric pressure-plasma enhanced chemical vapour deposition (AP-PECVD) reactor was carried out. The growth front evolution was studied as a function of time and position in the reactor. Focussed beam spectroscopic ellipsometry was used to assess the local film growth rate and atomic force microscopy (AFM) to analyse the surface roughness development. Spatially resolved AFM analysis showed a strong dependence of the rms roughness on the position, and consequently on the thickness and local deposition rate (LDR), in the reactor. Time resolved surface morphology analysis at two specific positions at high and low LDR indicated different growth exponents β = 0.33 and β = 0.11, respectively. From the analysis of the static roughness development in the AP-PECVD reactor certain limitations on the deposition time and the maximum LDR for dynamic or web rolled deposition conditions have been elucidated. Moreover, the system is characterized by a set of roughness exponents α loc = 0.9, α s = 1.6 and global roughness exponent α = 2.3. The different values of α indicate an anomalous scaling behaviour of the system whereas different growth exponents β suggest a breakdown of the anti-shadowing mechanism.

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Section: Second Order Statisticssupporting

confidence: 40%

Variable roughness development in statically deposited SiO₂ thin films: a spatially resolved surface morphology analysis

Meshkova

Starostin

Sanden

et al. 2018

J. Phys. D: Appl. Phys.

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“…15 However,  values above 0.5 have been reported by some authors. [26][27][28][29] Recent studies suggest that this must be due to some nonlocal effects in surface dynamics, 30 e.g., step-edge barrier, shadowing effect, (002) orientation.…”

Section: Xps and Quases Analysis Of The Growth Of Silvermentioning

confidence: 99%

Growth of silver on ZnO and SnO2 thin films intended for low emissivity applications

Álvarez

González

Espinós

et al. 2013

Applied Surface Science

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In the present work we have investigated the relationships existing between the optical properties and the growth mechanism, microstructure and surface roughness of SnO 2 and ZnO oxide films prepared by magnetron sputtering under conditions resembling those utilized in industry. Thin films of these oxides with different thicknesses were characterized by atomic force microscopy, glancing incidence X-ray diffraction (GIXRD), X-ray reflectometry and spectroscopic Ellipsometry. The roughness evolution of the film properties (density, surface roughness and refraction index) as a function of their thickness has been evaluated within the concepts of the Dynamic Scaling Theory of thin film growth. Zinc oxide films were rougher than tin oxide films of similar *Manuscript Click here to view linked References 2 thickness, indicating a different growing mechanism for the two materials. Silver was evaporated onto the surface of the two oxide thin films and its earlier stages of nucleation studied by background analysis of the X-ray photoemission spectra. A different nucleation mechanism was found depending on the nature of the oxide acting as substrate. The superior performance of the zinc oxide based low emissive coatings is related with a better wetting of silver on the surface of this oxide despite the comparatively lower roughness of the tin oxide layers.

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“…It appears that on the positive part of the distributions, the LMR media follows a fairly normal distribution, whereas PMR media exhibit a significant deviation from the Gaussian fit, indicating the presence of topography outliers. These features have often been associated with PVD processes, where shadowing effects can enhance the roughness at a length scale comparable to the grain size, leading to abnormally high peaks [16,17]. It is conceivable that these tall peaks could be preferentially removed in a wear process such as during burnishing.…”

Section: Wear-induced Corrosionmentioning

confidence: 97%

Tribological issues in perpendicular recording media

et al. 2006

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As the hard disk drive industry is transitioning from longitudinal (LMR) to perpendicular (PMR) recording, a new set of reliability challenges had to be overcome. In particular, the magnetic media structure, which relies on well-segregated grains of 6-10 nm diameter, can exhibit a rough structure, with peak-to-mean amplitude of 3-6 nm. In this paper, we will discuss how this topography could affect the overall reliability of the head-disk interface. In the first part, we will illustrate the loss of adequate coverage from the overcoat on PMR media, compared to the smoother LMR media, and we will attempt to quantify the topography in terms of its deviation from a Gaussian height distribution. Particular emphasis will be given to surface outliers and their removal during the burnishing process. The second part will be devoted to the lubricant preferential migration to the grain boundaries, driven by surface tension. It will be shown by an EELS line scan that the lubricant film is indeed thicker in the valleys between the grains, in agreement with surface tension driven redistribution. Finally, we will demonstrate that the Touchdown Height (TDH) of a PMR disk is $0.5 nm higher than its LMR counterpart, owing to its enhanced nano-roughness. Once recognized, these challenges can be overcome through a careful and thorough optimization of the various processing parameters, eventually leading to an overall reliability level equal or better than LMR media.

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Intrinsic anomalous surface roughening of TiN films deposited by reactive sputtering

Cited by 59 publications

References 49 publications

Variable roughness development in statically deposited SiO₂ thin films: a spatially resolved surface morphology analysis

Variable roughness development in statically deposited SiO₂ thin films: a spatially resolved surface morphology analysis

Growth of silver on ZnO and SnO2 thin films intended for low emissivity applications

Tribological issues in perpendicular recording media

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Intrinsic anomalous surface roughening of TiN films deposited by reactive sputtering

Cited by 59 publications

References 49 publications

Variable roughness development in statically deposited SiO2 thin films: a spatially resolved surface morphology analysis

Variable roughness development in statically deposited SiO2 thin films: a spatially resolved surface morphology analysis

Growth of silver on ZnO and SnO2 thin films intended for low emissivity applications

Tribological issues in perpendicular recording media

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Product

Resources

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Variable roughness development in statically deposited SiO₂ thin films: a spatially resolved surface morphology analysis

Variable roughness development in statically deposited SiO₂ thin films: a spatially resolved surface morphology analysis