2009
DOI: 10.1063/1.3174441
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Intrinsically limited mobility of the two-dimensional electron gas in gated AlGaN/GaN and AlGaN/AlN/GaN heterostructures

Abstract: We report on the intrinsically limited low-field mobility of the two-dimensional electron gas (2DEG) in gated AlGaN/GaN and AlGaN/AlN/GaN heterostructures. Monte Carlo transport simulations are carried out to calculate the room-temperature 2DEG mobilities in dependence on the electron sheet density. The simulated 2DEG mobilities are compared to the phonon-limited mobility of bulk GaN. We estimate a maximum 2DEG mobility of about 2700 cm2 V−1 s−1 for an electron sheet density of ∼5×1012 cm−2, which remarkably e… Show more

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Cited by 36 publications
(24 citation statements)
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“…8,9 Recently, we have assessed the intrinsically limited mobility in gated defect-free AlGaN/GaN heterostructures. 10 In the present work, we expand our mobility analysis by accounting for, in addition to unavoidable intrinsic phonon and alloy scattering, also interface roughness and dislocation scattering. The calculated mobilities are then compared to the measured data.…”
mentioning
confidence: 99%
“…8,9 Recently, we have assessed the intrinsically limited mobility in gated defect-free AlGaN/GaN heterostructures. 10 In the present work, we expand our mobility analysis by accounting for, in addition to unavoidable intrinsic phonon and alloy scattering, also interface roughness and dislocation scattering. The calculated mobilities are then compared to the measured data.…”
mentioning
confidence: 99%
“…In 2003, Sevik and Bulutay [275] studied hot-electron effects within GaN/AlGaN-based devices using Monte Carlo simulations of the electron transport, a portion of this electron transport corresponding to the specific case of the electron transport within AlN itself. Other research results, related to the electron transport within AlN, or alloys with AlN, have also been reported, and are further discussed in the scientific literature [147,161,276,277].…”
Section: Electron Transport Within Aln: a Reviewmentioning
confidence: 77%
“…3,4 The insertion of a thin AlN barrier interlayer improves transport properties of the two-dimensional electron gas ͑2DEG͒ and the mobility substantially increases due to a suppression of the alloy scattering. 5 The polarization Coulomb field scattering related to the strain variation in the AlGaN barrier layer has an important influence on the 2DEG electron mobility in the circular AlGaN/GaN HFET devices. 6 Since the strained AlGaN/AlN/GaN heterostructures have been the popular material structure for AlGaN/GaN HFETs, and the rectangular AlGaN/GaN HFETs are the main-stream Gallium nitridebased devices for microwave and high power applications, it is important to understand the role that the polarization Coulomb field scattering plays in the rectangular AlGaN/AlN/ GaN HFET devices.…”
Section: Polarization Coulomb Field Scattering In Algan/aln/gan Hetermentioning
confidence: 99%
“…This is attributed to the AlN interlayer in the strained AlGaN/AlN/GaN heterostructures to enlarge the average distance between the 2DEG electrons and the polarization charges which generate the polarization Coulomb field. 5,6 With the AlN interlayer, the conduction band discontinuity ⌬E C at the AlN/GaN interface is larger than that at the AlGaN/GaN interface. The penetration of the 2DEG electron wave function into the AlGaN barrier layer is restrained and reduced.…”
Section: Polarization Coulomb Field Scattering In Algan/aln/gan Hetermentioning
confidence: 99%
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