Introdução às técnicas de reflexão especular e de reflexão-absorção no infravermelho: (2) reflexão-absorção

Trasferetti, B. C.; Davanzo, Celso U.

doi:10.1590/s0100-40422001000100017

Cited by 3 publications

(2 citation statements)

References 34 publications

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“…Such conditions are well known and related to the metal surface selection rule. 18 Due to optical effects that are explained elsewhere, [19][20][21] signal intensification brought about by these conditions is related to detection of oscillators that vibrate perpendicular to the metal surface. Although the metal surface selection rule applies to both strong and weak oscillators on a metal surface, it has important implications for detection of the former, causing not only signal enhancements but also band shifts.…”

Section: Introductionmentioning

confidence: 99%

Modification of Plasma-Polymerized Organosiloxane Films by Irradiation with He⁺, Ne⁺, Ar⁺, and Kr⁺ Ions

et al. 2005

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The effects of ion irradiation on the composition, structure, compactness, and surface hardness of polyorganosiloxane films synthesized by plasma-enhanced chemical vapor deposition were investigated as a function of the ion mass and fluence. The films were obtained from a glow discharge plasma of a hexamethyldisiloxane (HMDSO)−O2−Ar mixture, and the irradiations were carried out with 170 keV He+, Ne+, Ar+, and Kr+ ions at fluences between 1 × 1014 and 1 × 1016 cm-2. To characterize the film elemental composition, two ion-beam analysis techniques were used: Rutherford backscattering spectroscopy (RBS) and forward recoil spectroscopy (FRS). The ion-beam-induced hydrogen loss from the films was significant. For the He+-irradiated samples, a H loss of about 50% with respect to the pristine or unirradiated film was observed for the highest fluence. The surface hardness measurements, performed with a nanoindenter, in films irradiated at a fluence of 1 × 1016 cm-2 were 8.1, 6.0, 4.7, and 1.6 GPa for He+, Ne+, Ar+, and Kr+, respectively. To examine the ion-induced structural transformations in the films, infrared reflection−absorption spectroscopy (IRRAS) was employed. From analysis of the spectra of the irradiated samples several conclusions could be drawn. For example, as the ion fluence increased, (i) the densities of methyl- and Si−O-related groups changed, (ii) film disorder increased, and (iii) groups such as Si−CH2−Si, and Si−OH, which were not present in the pristine film, were formed at lower fluences but disappeared when the latter attained their highest values. Furthermore, some of the absorption peaks that appeared at low fluences and increased with increasing fluence strongly indicate formation of carbon domains in the film. Finally, differences in the ion-induced modifications produced by the different ion species were analyzed in terms of the electronic and nuclear collisions of the ions traversing the film using the well-known SRIM simulation program.

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Section: Introductionmentioning

confidence: 99%

Modification of Plasma-Polymerized Organosiloxane Films by Irradiation with He⁺, Ne⁺, Ar⁺, and Kr⁺ Ions

et al. 2005

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“…As discussed in our earlier work,4 this condition provides spectra of high signal‐to‐noise ratio in the low energy range (2 000–400 cm −1 ), in comparison with those obtained in the most commonly used configuration (unpolarized IR beam at normal, or near‐normal, incidence). Furthermore, the use of oblique incidence and the p ‐polarized light intensifies the signal associated with vibrations preferentially oriented perpendicularly to the reflective metal substrate surface 17–19. This implies that the longitudinal optical (LO) propagation mode can be detected,20 which is not possible in normal or near‐normal incidence IR measurements.…”

Section: Experimental Partmentioning

confidence: 99%

Helium Ion Irradiation of Polymer Films Deposited from TMS‐Ar Plasmas

Gelamo

Durrant

Trasferetti

et al. 2007

Plasma Processes & Polymers

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Polymer films synthesized from plasmas of a tetramethylsilane ‐ Ar mixture were modified by irradiation with 170 keV He ions at fluences ranging from 1 × 1014 to 1 × 1016 cm−2. As revealed by infrared spectroscopy, the ion beam produced intense bond rearrangements, such as the depletion of bonding groups (CH and SiH), and induced the formation of new ones, such as OH and SiO. From the nanoindentation measurements, a remarkable increase in the surface hardness of the films was observed as the ion fluence was increased. The increases in hardness were accompanied by an increase in the film compaction as shown by using a combination of RBS and film thickness measurements. From both hardness and infrared measurements it was concluded that, under the He ion bombardment, the polymer structure is transformed into a silicon oxycarbide network.

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Improving the corrosion protection of 2524-T3-Al alloy through reactive sputtering Nb2O5 coatings

Moreto

Gelamo

Nascimento

et al. 2021

Applied Surface Science

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Introdução às técnicas de reflexão especular e de reflexão-absorção no infravermelho: (2) reflexão-absorção

Cited by 3 publications

References 34 publications

Modification of Plasma-Polymerized Organosiloxane Films by Irradiation with He⁺, Ne⁺, Ar⁺, and Kr⁺ Ions

Modification of Plasma-Polymerized Organosiloxane Films by Irradiation with He⁺, Ne⁺, Ar⁺, and Kr⁺ Ions

Helium Ion Irradiation of Polymer Films Deposited from TMS‐Ar Plasmas

Improving the corrosion protection of 2524-T3-Al alloy through reactive sputtering Nb2O5 coatings

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Introdução às técnicas de reflexão especular e de reflexão-absorção no infravermelho: (2) reflexão-absorção

Cited by 3 publications

References 34 publications

Modification of Plasma-Polymerized Organosiloxane Films by Irradiation with He+, Ne+, Ar+, and Kr+ Ions

Modification of Plasma-Polymerized Organosiloxane Films by Irradiation with He+, Ne+, Ar+, and Kr+ Ions

Helium Ion Irradiation of Polymer Films Deposited from TMS‐Ar Plasmas

Improving the corrosion protection of 2524-T3-Al alloy through reactive sputtering Nb2O5 coatings

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Product

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Modification of Plasma-Polymerized Organosiloxane Films by Irradiation with He⁺, Ne⁺, Ar⁺, and Kr⁺ Ions

Modification of Plasma-Polymerized Organosiloxane Films by Irradiation with He⁺, Ne⁺, Ar⁺, and Kr⁺ Ions