Introduction

Roosmalen, A. J. van; Baggerman, J. A. G.; Brader, S. J. H.

doi:10.1007/978-1-4899-2566-4_1

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1998

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“…B. Polymer Etching. Polymer film etching was performed at the Cornell Nanofabrication Facility (CNF) using a reactive ion etcher (RIE) by Applied Materials, Inc. An RIE combines both the physical sputtering of an ion mill and the chemically reactive nature of a plasma etcher. The parameters used in our etching process consisted of 10 cm 3 (STP)/min of CF 4 , a pressure of 2 mTorr, and a power of approximately 0.08 W/cm 2 .…”

Section: Methodsmentioning

confidence: 99%

Depth Profiling Block Copolymer Microdomains

et al. 1998

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We have studied the microdomain pattern in a block copolymer system using a recently developed imaging technique. We observe pronounced registry of microdomains from layer to layer, the propagation and evolution of disclinations, and novel morphologies which form at the edge of an island. The imaging of the microdomains is achieved with a nonselective etching technique which smoothly etches away sufficient material to expose the underlying microdomain layer to the surface. Using a low-voltage, high-resolution scanning electron microscope, we image the microdomains of this exposed layer which have been tagged with a staining agent.

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Section: Methodsmentioning

confidence: 99%