Inverse metal-stripe polarizers

Honkanen, Marko; Kettunen, Ville; Kuittinen, Markku; Lautanen, Jari; Turunen, Jari; Schnabel, B.; Wyrowski, Frank

doi:10.1007/s003400050590

Cited by 32 publications

(21 citation statements)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…For periods d > 246.8 nm an inverse effect occurs. At periods of d = 382.8 and 607.5 nm the maximum of this inverse effect is obtained in agreement with [7]. Both points are close to the Rayleigh wavelengths (vertical dashed lines).…”

Section: Introductionsupporting

confidence: 84%

“…These grating parameters can be used to maximize the inverse effect. A polarization ratio of R > 100 has been demonstrated theoretically and a ratio of R = 10 has been shown experimentally [7].…”

Section: Introductionmentioning

confidence: 90%

“…Here the TE transmission efficiency η TE exceeds the TM transmission efficiency η TM . This inverse effect exists in the resonance region for a class of metal-stripe polarizers as shown in [7]. The effect depends strongly on different grating parameters such as the grating period d, the grating depth h, the fill factor f or the angle of incidence θ of the incoming wave.…”

Section: Introductionmentioning

confidence: 97%

“…A recent publication [7] shows that for special sets of grating parameters an inverse effect can be obtained. Here the TE transmission efficiency η TE exceeds the TM transmission efficiency η TM .…”

Section: Introductionmentioning

confidence: 99%

See 3 more Smart Citations

Highly Selective SiO₂ Etch Employing Inductively Coupled Hydro-Fluorocarbon Plasma Chemistry for Self Aligned Contact Etch

Iijima¹,

Ishikawa²,

Yang

et al. 1997

Jpn. J. Appl. Phys.

View full text Add to dashboard Cite

Inverse metal-stripe polarizers are optical elements that have a higher transmission efficiency in TE polarization than in TM polarization. This phenomenon is explained by the wave-guiding effect of the TM-mode in the grating and by surface plasmons on the metal stripes. The rigorous coupled-wave method is used for calculating the electromagnetic field inside the grating. A strong inverse polarization effect is demonstrated experimentally for silver-stripe polarizers.

show abstract

Section: Introductionsupporting

confidence: 84%

Section: Introductionmentioning

confidence: 90%

Section: Introductionmentioning

confidence: 97%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Highly Selective SiO₂ Etch Employing Inductively Coupled Hydro-Fluorocarbon Plasma Chemistry for Self Aligned Contact Etch

Iijima¹,

Ishikawa²,

Yang

et al. 1997

Jpn. J. Appl. Phys.

View full text Add to dashboard Cite

show abstract

“…In the transition region, the mask polarizes and diffracts the radiation, and certain materials are capable of transmitting more TE polarization than TM. Wire grid polarizers passing predominantly TE polarization are appropriately named inverse wire grid polarizers, and have been studied by Honkanen et al [5] Traditional wire grid polarizer features are relatively large and are similar in size to the wavelength of light incident upon the polarizer; the wires approximate a planar metal surface. Inverse wire grid polarizers utilize effects similar to those that occur in "small" noble metal (Au, Ag, Cr, etc) clusters.…”

mentioning

confidence: 99%

Mask induced polarization effects at high NA

Estroff

Fan

Bourov

et al. 2005

Optical Microlithography XVIII

View full text Add to dashboard Cite

It is important to understand how a photomask will polarize incident radiation. This paper presents data collected on binary mask and various attenuated phase shifting mask materials, feature sizes, duty ratios, and illumination schemes via rigorous coupled wave analysis, extinction spectroscopy, and 193nm lithographic evaluation. Additionally, the result of polarization effects due to the photomask on imaging has been studied. It was found that in the majority of the cases, higher NA led to greater polarization effects. All mask materials predominantly pass the TM polarization state for the 0 order, whereas different materials and duty ratios affect the polarization of the first diffracted orders differently. The polarization effects contributed by mask materials being considered for use in high NA imaging systems need to be examined. The degree of polarization as a function of n and k is presented, providing an introduction to the desirable properties of future mask materials. Materials with higher refractive indices and lower extinction coefficients tend to pass more of the TM polarization state, which is undesirable. Materials with lower indices and relatively wide range of extinction coefficients pass more TE polarized radiation. The duty ratio, critical dimension, mask material, material thickness, and illumination scheme all influence mask induced polarization effects.

show abstract

Investigation of inverse polarization transmission through subwavelength metallic gratings in deep ultraviolet band

Kang

Dong

Vartiainen

et al. 2013

Optics Communications

View full text Add to dashboard Cite

Inverse metal-stripe polarizers

Cited by 32 publications

References 0 publications

Highly Selective SiO₂ Etch Employing Inductively Coupled Hydro-Fluorocarbon Plasma Chemistry for Self Aligned Contact Etch

Highly Selective SiO₂ Etch Employing Inductively Coupled Hydro-Fluorocarbon Plasma Chemistry for Self Aligned Contact Etch

Mask induced polarization effects at high NA

Investigation of inverse polarization transmission through subwavelength metallic gratings in deep ultraviolet band

Contact Info

Product

Resources

About

Inverse metal-stripe polarizers

Cited by 32 publications

References 0 publications

Highly Selective SiO2 Etch Employing Inductively Coupled Hydro-Fluorocarbon Plasma Chemistry for Self Aligned Contact Etch

Highly Selective SiO2 Etch Employing Inductively Coupled Hydro-Fluorocarbon Plasma Chemistry for Self Aligned Contact Etch

Mask induced polarization effects at high NA

Investigation of inverse polarization transmission through subwavelength metallic gratings in deep ultraviolet band

Contact Info

Product

Resources

About

Highly Selective SiO₂ Etch Employing Inductively Coupled Hydro-Fluorocarbon Plasma Chemistry for Self Aligned Contact Etch

Highly Selective SiO₂ Etch Employing Inductively Coupled Hydro-Fluorocarbon Plasma Chemistry for Self Aligned Contact Etch