Investigating the Applicability of Metal Ion Implantation Technique (MEVVA) to Textile Surfaces

Abstract

Polyethylene terephalate (PET) samples were modified by Cu, C, Ti, and Cr implantation using a metal vapor vacuum arc (MEVVA) implanter. The ions were implanted at an accelerating voltage of 30 kV with a dose ranging from 1 × 1014 to 1 × 1017 ions/cm2. In the first part of this study, Cu ions were implanted to improve the electrical properties of PET woven fabrics, and in the second part, C, Ti and Cr ions were implanted to enhance the mechanical properties of PET membrane fabrics. After implantation, the results showed that the half-charge decay time of implanted fabric lessened to milliseconds, and the friction coefficient and wear loss values decreased significantly. The surface morphologies of the samples were examined by scanning electron microscopy and atomic force microscopy. The changes in chemical structure were observed by IR spectra.

Microbial modification of polyethylene terephthalate fabric

“…Trametes versicolor (ATCC 11235; FRPL 28A IMI, EGHAM SURVEY). PET fabric was double fabric palin weave 100% PET, 34 threads/cm in warp, 25 threads/cm in weft directions and unit weight was 223 g/m2 and purchased from BOYTEKS (Kayseri, Turkey).…”

“…The classical chemical modification of synthetic polymers requires high amounts of energy and chemicals, which are partially discharged to the environment. Furthermore, some of the substances used during the processing of fibers are released from the end products due to weak bonding, causing serious health risks and reducing the technical life‐time of the products 1, 2…”

The Use of New Technologies in Dyeing of Proteinous Fibers

“…Ion implantation was first done by Rutherford in 1906, when he bombarded aluminum foil with helium ions. Ion implantation has been applied to metals, ceramics, plastics, and polymers [134].…”

“…They differ in the way in which they either form the plasma or make the surface to be implanted the negative electrode. These methods are mass-analyzed ion implantation, direct ion implantation and plasma source ion implantation [134].…”

“…The MEV-VA source makes use of the principle of vacuum arc discharge between the cathode and the anode to create dense plasma from which an intense beam of metal ions of the cathode material is extracted. This metal ion source operates in a pulse mode [134]. The Use of New Technologies in Dyeing of Proteinous Fibers http://dx.doi.org/10.5772/53912…”