Investigating the Electromechanical Behavior of Unconventionally Ferroelectric $Hf_{0.5}Zr_{0.5}O_{2}$-based Capacitors Through Operando Nanobeam X-ray Diffraction

Stylianidis, Evgenios; Pranav, Surabhi,; Hamming-Green, Ruben; Salverda, Mart; Wei, Yingfen; Burema, Arjan; Matzen, Sylvia; Banerjee, T.; Björling, Alexander; Mukherjee, Binayak; Dutta, Sangita; Aramberri, Hugo; Íñiguez, Jorgé; Noheda, Beatriz; Carbone, Dina; Nukala, Pavan

doi:10.48550/arxiv.2212.01680

2022

DOI: 10.48550/arxiv.2212.01680

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Investigating the Electromechanical Behavior of Unconventionally Ferroelectric $Hf_{0.5}Zr_{0.5}O_{2}$-based Capacitors Through Operando Nanobeam X-ray Diffraction

Evgenios Stylianidis¹,

Surabhi, Pranav²,

Ruben Hamming-Green³

et al.

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Investigating the Electromechanical Behavior of Unconventionally Ferroelectric $Hf_{0.5}Zr_{0.5}O_{2}$-based Capacitors Through Operando Nanobeam X-ray Diffraction

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