2013
DOI: 10.7498/aps.62.037301
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Investigation of anti-reflection properties of crystalline silicon solar cell surface silicon nanowire arrays

Abstract: In order to trap more sunlight onto the crystalline silicon solar cell and improve the photo-electric conversion efficiency, it is very important to study the optical scattering properties of silicon nanowire arrays on silicon wafer. The rigorous coupled wave analysis method is used for optical simulation, and the Taguchi method is used for efficient optimization. The simulation results show that at the above-mentioned wavelengths the reflectance of the optimized structure is less than 2%, and also able to ach… Show more

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Cited by 6 publications
(1 citation statement)
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“…Silicon nanorods (SiNRs) have drawn great interest in recent years due to their exciting applications in numerous fields of research such as field effect transistors (FETs), [1][2][3][4] biological and chemical sensors, [5][6][7][8][9] and photovoltaics (PVs). [10][11][12][13][14][15] Various methods have been developed for fabricating SiNRs, including vapor-liquid-solid (VLS) growth, [16][17][18] oxide assisted growth (OAG), [19][20][21] reactive ion etching (RIE), [22][23][24] and metal-assisted chemical etching (MACE). [25][26][27][28][29][30] Among these methods, MACE is undoubtedly the most promising approach to large-scale fabrication of SiNRs, due to its low cost and high output.…”
mentioning
confidence: 99%
“…Silicon nanorods (SiNRs) have drawn great interest in recent years due to their exciting applications in numerous fields of research such as field effect transistors (FETs), [1][2][3][4] biological and chemical sensors, [5][6][7][8][9] and photovoltaics (PVs). [10][11][12][13][14][15] Various methods have been developed for fabricating SiNRs, including vapor-liquid-solid (VLS) growth, [16][17][18] oxide assisted growth (OAG), [19][20][21] reactive ion etching (RIE), [22][23][24] and metal-assisted chemical etching (MACE). [25][26][27][28][29][30] Among these methods, MACE is undoubtedly the most promising approach to large-scale fabrication of SiNRs, due to its low cost and high output.…”
mentioning
confidence: 99%