2021 IEEE 34th International Conference on Micro Electro Mechanical Systems (MEMS) 2021
DOI: 10.1109/mems51782.2021.9375268
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Investigation of Deep Dry Etching of 4H SIC Material for MEMS Applications Using DOE Modelling

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Cited by 5 publications
(3 citation statements)
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“…Various SiC-based MEMS devices, including thin-film thermistors, temperature sensors, pressure sensors, and resonators, have been produced and used in harsh operating environments [2][3][4][5]. Due to its high hardness and corrosion resistance, it cannot be micromachined by conventional semiconductor processing techniques [6,7]. Despite the use of non-traditional processing methods such as mechanical drilling and ultrasonic vibration on it, there are still issues such as low integration efficiency and poor processing quality [8,9].…”
Section: Introductionmentioning
confidence: 99%
“…Various SiC-based MEMS devices, including thin-film thermistors, temperature sensors, pressure sensors, and resonators, have been produced and used in harsh operating environments [2][3][4][5]. Due to its high hardness and corrosion resistance, it cannot be micromachined by conventional semiconductor processing techniques [6,7]. Despite the use of non-traditional processing methods such as mechanical drilling and ultrasonic vibration on it, there are still issues such as low integration efficiency and poor processing quality [8,9].…”
Section: Introductionmentioning
confidence: 99%
“…Reactive ion etching (RIE) is the most promising technique for SiC bulk micromachining. However, most reported SiC dry etching processes still demonstrate insufficient etching rates (typically 1 µm/min or less), poor selectivity to mask materials, rough etch surfaces, non-vertical profiles, and microtrenching effects [10][11][12][13] . As summarized by Dowling et al, the aspect ratio of SiC structures fabricated by plasma etching reported in the literature is usually less than 10, and these structures typically exhibit a "V" shape due to the non-vertical nature of the sidewall 11 .…”
Section: Introductionmentioning
confidence: 99%
“…Typically, the SiC etching rate by dry etching is below 1 μm/min. In 2021, Erbacher et al reported the highest etching rate (4 μm/min) so far by reactive ion etching (RIE) with SF6/O2/He gas mixture [13]. However, this etching rate is still relatively low compared to Si bulk etching method, and it requires a particular inductively coupled plasma (ICP) etcher with high power density.…”
Section: Introductionmentioning
confidence: 99%