2018
DOI: 10.1016/j.jcrysgro.2018.09.020
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Investigation of defect creation in GaP/Si(0 0 1) epitaxial structures

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Cited by 15 publications
(1 citation statement)
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“…Although it has been experimentally demonstrated that the GaP/Si(001) interface is typically sharp (with a maximum interface region extension over one monolayer), it has been shown that the intermixed or terraced GaP/Si(100) interfaces atomic configurations are thermodynamically more favorable than the atomically abrupt one. Therefore, we performed the same calculations on intermixed (compensated) and terraced interfaces in order to compare the EDOS of the abrupt and hydrogenated structures with those of compensated and terraced interfaces.…”
Section: Resultsmentioning
confidence: 99%
“…Although it has been experimentally demonstrated that the GaP/Si(001) interface is typically sharp (with a maximum interface region extension over one monolayer), it has been shown that the intermixed or terraced GaP/Si(100) interfaces atomic configurations are thermodynamically more favorable than the atomically abrupt one. Therefore, we performed the same calculations on intermixed (compensated) and terraced interfaces in order to compare the EDOS of the abrupt and hydrogenated structures with those of compensated and terraced interfaces.…”
Section: Resultsmentioning
confidence: 99%