2023
DOI: 10.1007/s10854-023-10320-1
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Investigation of dielectric relaxation and ac conductivity in Au/(carbon nanosheet-PVP composite)/n-Si capacitors using impedance measurements

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Cited by 4 publications
(1 citation statement)
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“…The studied Al/PbO/SnO 2 /p-Si Schottky structures were created on a p-type Si (100) wafer with a thickness of 280 μm and 1–10 ohm. Ohmic contact and the cleaning procedures were described in refs and . To build the SnO 2 layer on the Si substrate after ohmic contact, a solution containing 27.44 wt % stannic chloride (SnCl 4 ·5H 2 O), 32.21 wt % ethyl alcohol (C 2 H 5 OH), and 40.35 wt % deionized water (H 2 O) was sprayed to the substrate at 400 °C.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…The studied Al/PbO/SnO 2 /p-Si Schottky structures were created on a p-type Si (100) wafer with a thickness of 280 μm and 1–10 ohm. Ohmic contact and the cleaning procedures were described in refs and . To build the SnO 2 layer on the Si substrate after ohmic contact, a solution containing 27.44 wt % stannic chloride (SnCl 4 ·5H 2 O), 32.21 wt % ethyl alcohol (C 2 H 5 OH), and 40.35 wt % deionized water (H 2 O) was sprayed to the substrate at 400 °C.…”
Section: Experimental Methodsmentioning
confidence: 99%