“…First, the difference in ionic radii of Ti þ4 and Nd þ3 may be a contributing factor; however, there are many reports where texturing was not observed by doping Nd in TiO 2 . 8,13,16,17,19,20 Second, and more likely, reason could be the slow growth rate of sputtering, a well known technique for atomically smooth growth. In the present case, the growth rate was 0.6 Å /s, which perhaps helped the preferred orientation growth well supported by a constant substrate temperature of 500 C. This might have helped in the adatoms to find minimum energy surface sites to continue the accelerated growth of (004) planes only.…”