Investigation of Gold Nanolayer Properties Using X-Ray Reflectometry and Spectroscopic Ellipsometry Methods

Abstract

X-ray reflectometry and spectroscopic ellipsometry methods were applied for determination of physical properties of gold nonolayers. The nanolayers were prepared by sputtering of gold on different substrates: borosilicate glass, polished crystalline quartz and crystalline silicon. With X-ray reflectometry technique roughness of the substrates and density, thickness and roughness of gold layers were determined. The results showed decrease in density of the gold layers due to their nanometer thickness and that roughness of the underlayer affects roughness of the gold layer. In addition, thicknesses of the gold layers measured with spectroscopic ellipsometry turned out to be in agreement, within the experimental uncertainty, with results of the X-ray reflectometry method.

Energy deposition and formation of nanostructures in the interaction of highly charged xenon ions with gold nanolayers

“…Thickness turned to be consistent with the declared one (100 nm), but the density was slightly lower (but within the uncertainties) than the bulk density. The XRR, XRD and GIXRD measurements were performed with X'Pert Pro MPD reflectometer/diffractometer (for details see [53,54]), placed at Institute of Physics of UJK (Kielce, Poland). The 100 nm Au nanolayers were irradiated at the Kielce EBIS facility of the Jan Kochanowski University (Kielce, Poland) [33], under high vacuum conditions.…”

A study of growth and thermal dewetting behavior of ultra-thin gold films using transmission electron microscopy

“…20 The fine tuning of optical response essentially demands the precisely controlled growth technique along with sub-nanometer scale morphological characterization. 21,22 A variety of physical deposition techniques such as laser ablation, 23,24 thermal evaporation, 25 e-beam evaporation, 26 and sputtering 17 are used for the deposition of Au ultra-thin films. Among these, sputtering is widely used for homogeneous and controlled morphological growth of the metals thin film.…”