2002
DOI: 10.1016/s0022-0248(01)01880-2
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Investigation of indium segregation in InGaAs/(Al)GaAs quantum wells grown by MOCVD

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Cited by 31 publications
(11 citation statements)
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“…The observed compositional grading at the interface could either result from; (a) surface segregation at the growth front during the layer growth or growth pause between SL layers [10,11], and/or (b) solid-state diffusion during the growth of subsequent layers, due to continued annealing as the structure is grown. Based on the growth rates in Table 1, the growth of 40 stages within a typical QCL active region takes~6.42 hr (including the 5 s pause time in between each layer) [12].…”
Section: Extent Of Interfacial Mixing In the Thin-motif Samplementioning
confidence: 99%
“…The observed compositional grading at the interface could either result from; (a) surface segregation at the growth front during the layer growth or growth pause between SL layers [10,11], and/or (b) solid-state diffusion during the growth of subsequent layers, due to continued annealing as the structure is grown. Based on the growth rates in Table 1, the growth of 40 stages within a typical QCL active region takes~6.42 hr (including the 5 s pause time in between each layer) [12].…”
Section: Extent Of Interfacial Mixing In the Thin-motif Samplementioning
confidence: 99%
“…It means, that the alloy ordering, the surface segregation and In desorption are similar in both cases. Marmalyuk et al [10] reported the temperature-saturation limit of the desorption effectivity at 700 1C. The lower PL intensity of structures grown at lower temperatures can be explained by higher impurity concentration, particularly that of oxygen or poorer alloy ordering.…”
Section: Article In Pressmentioning
confidence: 99%
“…The problem of optimization of growth conditions is still open, despite many experiments devoted to investigation of InGaAs QW quality dependence on alloy ordering and interface abruptness [5][6][7][8]. The difficulty comes from the fact that a number of different phenomena, both physical and technological, require tuning during the epitaxial process [9,10]. Moreover, the complications partly arise from the fact, that the thermodynamic and kinetic conditions in the reactor chamber strongly affect the composition uniformity and the interface sharpness.…”
Section: Introductionmentioning
confidence: 99%
“…AlAs has been chosen to reduce surface segregation of indium atoms at QW interfaces frequently observed in InGaAs/GaAs structures. 5 The electronic band structure of such InGaAs QWs heteroepitaxial growth is known to be affected by many factors. First, indium quantity governs band gap energy by following the Vergard's law.…”
Section: Introductionmentioning
confidence: 99%