Investigation of laser annealing mechanisms in thin film coatings by photothermal microscopy

Escola, Facundo Zaldívar; Míngolo, N.; Martínez, Sandra; Rocca, J. J.; Menoni, Carmen S.

doi:10.1364/oe.27.005729

Cited by 7 publications

(7 citation statements)

References 20 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…La medición por reflexión es utilizada cuando se desea conocer el apartamiento de una muestra a lo largo del eje normal a su superficie, como es el caso de los sistemas de control de foco automatizado. Por otra parte, la medición por transmisión no es sensible a dicho apartamiento sino al gradiente del índice de refracción de la muestra, una magnitud controlada en los sistemas de medición por lente térmica [12,13]. Para el caso por reflexión (Fig.…”

Section: Configuraciones Desacopladasunclassified

“…El método de medición de error de foco utilizando un haz de luz astigmático [1,2] se utiliza ampliamente debido a su fácil operación, alta sensibilidad y bajo costo. Actualmente, el mismo se incorpora en los diseños de la mayoría de los cabezales de lectoras y grabadoras de CD, DVD y Blu-Ray, y existe un gran número de aplicaciones en ciencia entre las cuales pueden destacarse los sistemas de medición de desplazamientos lineales y angulares [3], perfilometría [4][5][6], medición de espesores [7], interferometría [8], acelerómetros [9], medición de propiedades térmicas [10] y los desarrollos del grupo para la caracterización de la absorción de óptica utilizada para láseres de muy alta potencia [11][12][13].…”

Section: Introductionunclassified

“…El láser de prueba utilizado posee un perfil gaussiano que puede ser elíptico y astigmático o circular y su astigmatismo generarse en la etapa 2 por medio de la utilización de al menos una lente cilíndrica. La longitud de onda (λ Prueba ) del láser de prueba es elegida en función de las propiedades ópticas de la muestra y dependiendo de si el sistema se construye para la medición por transmisión [11][12][13] o por reflexión [10].…”

Section: Introductionunclassified

“…La señal detectada es denominada señal de error de foco y se compone a partir de la señal de tensión proveniente de cada uno de los cuadrantes, mediante el cálculo del desbalance en las diagonales (C1+C3)-(C2+C4). Este cálculo es realizado en la etapa 4 ya sea por medio de amplificadores operacionales [13] o mediante la digitalización de cada canal y el postprocesamiento.…”

Section: Introductionunclassified

See 3 more Smart Citations

Focus Error Measurement System: Practical Design Considerations

Escola¹

2023

AnAFA

View full text Add to dashboard Cite

A detailed study of the practical design considerations for a focus error measurement system through numerical simulations, based on ABCD ray matrix for Gaussian beams, is presented. The results obtained can be applied in an equivalent way to the cases of reflection or transmission measurement, since these are identical by means of a change of variables. In all cases, the calculations consider the actual shape of the detector used, since these have gaps that separate the quadrants, affecting their efficiency. The distances involved between the optical components are swept in order to study the behavior of the sensitivity, maximizing it depending on the application.

show abstract

Section: Configuraciones Desacopladasunclassified

Section: Introductionunclassified

See 2 more Smart Citations

Focus Error Measurement System: Practical Design Considerations

Escola¹

2023

AnAFA

View full text Add to dashboard Cite

show abstract

“…Whether considering metal‐oxide semiconductors, dielectrics and conductors, the essential role of LA onto their transition into high‐quality films has been extensively investigated . Particularly in solution processes (sol–gels, etc.…”

Section: Laser Annealingmentioning

confidence: 99%

Recent Progress in Photonic Processing of Metal‐Oxide Transistors

Yarali

Koutsiaki

Faber

et al. 2019

Adv Funct Materials

View full text Add to dashboard Cite

(1 of 37)high mobility (µ) (even in amorphous phase), wide bandgap (transparent in the visible range), and the ability to be controllably doped. Importantly, they can be grown into thin films and various nanostructures with different scalable deposition techniques, including vacuum-based methods such as physical vapor deposition (PVD) [7,8] and chemical vapor deposition (CVD) [9] as well as solution-based processes such as spray [10] and spin coating. [11] Moreover, the resulting layers can be easily patterned using standard fabrication procedures and as such can be integrated into state-of-the-art processes for (opto)electronic applications. The above-mentioned capabilities have led to a plethora of applications such as switching backplanes for displays, transparent and flexible electronics, integrated circuits (ICs), photovoltaics (PVs), organic light-emitting diodes (OLEDs), capacitors, batteries, photocatalytic devices, electrochromics and memory devices, to name but a few. [8,[12][13][14] Because of their ability to be doped, their electronic properties can be tuned from dielectrics to semiconductors and conductors. This characteristic versatility has recently been exploited to stretch the range of their applications to new technological sectors, such as plasmonics in the near infrared and midinfrared spectral ranges. [12,15] One of the driving applications of metal oxides is in thinfilm transistors (TFTs) for large area electronics such as current driven optical displays and ICs. Following the early demonstrations, [16] most effort focused on the fabrication and processing of metal oxides TFTs paying particular attention to the device performance and applications. [1,5,6,17] Especially when processed over large areas, as in the case for display applications, the complexity to precisely control the device reliability and reproducibility becomes a challenging aspect of any TFT technology. To that respect, solution-based techniques progressed rapidly due to their lower cost and higher throughput compared to vacuum-based techniques. In both cases, the metal-oxide deposition has so far been limited to high processing temperatures (>250 °C) (Figure 1a) which renders the technology incompatible with inexpensive, temperature-sensitive substrates such as polymers, the material class of choice for various high throughput manufacturing techniques such as roll-to-roll (R2R) and sheet-to-sheet (S2S)Over the past few decades, significant progress has been made in the field of photonic processing of electronic materials using a variety of light sources. Several of these technologies have now been exploited in conjunction with emerging electronic materials as alternatives to conventional hightemperature thermal annealing, offering rapid manufacturing times and compatibility with temperature-sensitive substrate materials among other potential advantages. Herein, recent advances in photonic processing paradigms of metal-oxide thin-film transistors (TFTs) are presented with particular emphasis on the use of various light sour...

show abstract

Multipass lock-in thermography for the study of optical coating absorption

et al. 2022

View full text Add to dashboard Cite

The development of high-power lasers requires optics with very low absorption to avoid detrimental thermal effects. In this work, we discuss our recent developments on the use of lock-in thermography to measure absorption. We apply this technique in a multipass configuration to increase the effective power on the tested samples. We present a system based on a kW-class ytterbium fiber laser operating at 1.07 µm wavelength, which enables exposing samples to 5 kW effective power and measuring absorption in the ppm range. The implementation, calibration procedure, and obtained performance are discussed with some applications to single-layer coatings of H f O 2 , T a 2 O 5 , T i O 2 , N b 2 O 5 , and S i O 2 deposited by plasma-assisted electron beam deposition.

show abstract

Investigation of laser annealing mechanisms in thin film coatings by photothermal microscopy

Cited by 7 publications

References 20 publications

Focus Error Measurement System: Practical Design Considerations

Focus Error Measurement System: Practical Design Considerations

Recent Progress in Photonic Processing of Metal‐Oxide Transistors

Multipass lock-in thermography for the study of optical coating absorption

Contact Info

Product

Resources

About