1977
DOI: 10.1007/bf00605537
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Investigation of low vacuum condensates of aluminum using electron microscopy and spectroscopy

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Cited by 5 publications
(4 citation statements)
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“…Black aluminum (Black Al) is a metal that has good thermal stability and at the same time is inexpensive to produce. [ 15 ] For example, it was shown in a previous study [ 16 ] that low‐vacuum aluminum condensates obtained in the temperature range of 100–300 °C did not change their structure after heating to temperatures of 400–500 °C. However, there is still limited research available that considers the thermal stability of thin Black Al films fabricated using various methods.…”
Section: Introductionmentioning
confidence: 99%
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“…Black aluminum (Black Al) is a metal that has good thermal stability and at the same time is inexpensive to produce. [ 15 ] For example, it was shown in a previous study [ 16 ] that low‐vacuum aluminum condensates obtained in the temperature range of 100–300 °C did not change their structure after heating to temperatures of 400–500 °C. However, there is still limited research available that considers the thermal stability of thin Black Al films fabricated using various methods.…”
Section: Introductionmentioning
confidence: 99%
“…Black aluminum (Black Al) is a metal that has good thermal stability and at the same time is inexpensive to produce. [15] For example, it was shown in a previous study [16] that low-vacuum aluminum condensates obtained in the temperature range of 100-300 C did not change their structure after heating to temperatures of 400-500 C. However, there is still limited research available that considers the thermal stability of thin Black Al films fabricated using various methods.This study addresses the thermal stability of Black Al films with a thickness of 530 nm deposited on unheated fused silica substrates using pulsed DC magnetron sputtering. The magnetron sputtering technique has the advantage of producing thin films on large-area substrates and also allows efficient tuning of nano-, micro-, and macrostructures of the resulting films by changing the deposition parameters.…”
mentioning
confidence: 99%
“…Several techniques capable of preparing BMs have been reported: (1) deposition by thermal evaporation (TE), [2][3][4][5]14,[16][17][18][19] (2) deposition by magnetron sputtering (MS), [20][21][22] (3) electrodeposition, 7,8,12 (4) thin metal lm deposition on dielectric substrates with imprinted antireective black silicon (BSi) moth-eye-like nanostructures, 6,23 and (5) laser surface modication. 10,11,24,25 Techniques (1) through (4) are suitable for the fabrication of BM thin lms on large-area substrates, while technique (5) can only be used for the modication of either bulk materials or thin lm surfaces over limited areas.…”
Section: Introductionmentioning
confidence: 99%
“…BMs have been prepared by magnetron sputtering, 14–17 thermal evaporation, 4,18–22 electrodeposition, 6,7 deposition on a dielectric substrate with imprinted moth-eye-like nanostructures, 5 and by laser surface treatment. 10,23–26 The porosities introduced during the metal films growth or during the treatments before and after the deposition help to create a structure allowing complex subwavelength electromagnetic interactions with the light in wide wavebands.…”
Section: Introductionmentioning
confidence: 99%