Gd thin films react
at room temperature with hydrogen to form hydrides,
by nucleation and growth, even for very low H content (H/Gd > 0.01).
This phase transformation can be destabilized and suppressed in highly
stressed films. In the present study, a thin Gd layer was deposited
on a W(110) substrate, leading to a highly strained film. Following
exposure to hydrogen, the overall strain in the film is further increased.
Hydrogen was found to dissolve in the metallic matrix without forming
distinct hydride nuclei. However, the lateral distribution of H in
the film evolved with time, from a rather homogeneous repartition
to an inhomogeneous one, reflecting the process of spinodal decomposition
of hydrogen in the film. The spinodal decomposition process was monitored
using scanning tunneling microscopy. This process involves principally
the diffusion of H in the film, but a slow change in shape of the
Gd islands covering the wetting layer was also observed. These changes
were used to monitor the evolution of the local strains and hydrogen
concentrations with time and to draw strain and composition maps at
different times, before and after hydrogenation. Numerical simulations
of the process, using the chemical potential of H in the highly strained
film and applying the Cahn–Hilliard equation, were shown to
be in good agreement with the experimental observations, in both spatial
and temporal scales. The present study shows that high tensile strains
strongly affect the dynamics of the H distribution and the composition
of the H-containing phases, opening the route for future studies of
M–H systems on the nanometer scale.