Abstract:The particle kinetic energy (PKE) in a slurry film between the pad and wafer during chemical-mechanical polishing (CMP) under the assistance of electro-kinetic force (EKF) was investigated. Novel simulation results of a three-dimensional electro-osmosis flow (3D-EOF) model have been well-verified by velocity fields of particle image velocimetry analysis. The velocity magnitudes of EOF under various simulation conditions have been compared with both experimental and theoretical results. Analysis results for PKE… Show more
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