We describe the fabrication of metamaterial magnifying hyperlenses with subwavelength wire array structures for operation in the mid-infrared (around 3 µm). The metadevices are composed of approximately 500 tin wires embedded in soda-lime glass, where the metallic wires vary in diameter from 500 nm to 1.2 µm along the tapered structure. The modeling of the hyperlenses indicates that the expected overall losses for the high spatial frequency modes in such metadevices are between 20 dB to 45 dB, depending on the structural parameters selected, being promising candidates for far-field subdiffraction imaging in the mid-infrared. Initial far-field subdiffraction imaging attempts are described, and the problems encountered discussed.
IntroductionA combination of conducting/dielectric layers or a subwavelength array of metallic wires embedded in a dielectric exhibit hyperbolic dispersion due to the high anisotropy of the medium [1]. In such hyperbolic metamaterial, high transverse spatial frequencies, which contain subdiffraction information and would be evanescent in conventional isotropic media, can propagate. A curved multilayer metamaterial and a tapered wire array medium, called hyperlenses, can also magnify the guided spatial frequencies, transforming the subdiffraction information into air-propagating waves, allowing subdiffraction imaging in the far-field [2-4].Far-field subdiffraction imaging with multilayer metal/dielectric metamaterial has been demonstrated at UV [3, 5] and visible [6] frequencies. This class of hyperlenses can be fabricated by the deposition of ultra-thin and smooth films, but exhibits high losses and high reflectivity due to its large metal fraction. High transmission can be obtained if the operational region is close to the metal's plasma frequency, where their reflectivity decreases, limiting their operation to narrow bands at UV/visible frequencies if noble metals are employed. Semiconductors can be combined with metal or highly doped semiconductor layers to shift the effective plasma frequency of the metamaterial to lower frequencies, leading to hyperlenses operating at near-infrared (NIR) [7] and at mid-infrared (MIR) [8] frequencies. Recent, theoretical investigations indicate that the losses of multilayer semiconductor material can be reduced by maximizing the mean scattering time of the doped layers and adjusting the layer thickness ratio [9], opening up new possibilities for far-field subdiffraction imaging in the MIR with semiconductor-based metamaterial. However, relatively narrow band, short wavelength operation and lack of a large volume fabrication method are still the main drawbacks of this class of hyperlens.