2024
DOI: 10.1016/j.apsadv.2023.100546
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Investigation of silicon carbon oxynitride thin film deposited by RF magnetron sputtering

Abbas Ali Aghaei,
Akbar Eshaghi,
Mazaher Ramazani
et al.
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Cited by 2 publications
(1 citation statement)
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“…These characteristic features of ZnO are the main reason why it is frequently preferred by researchers [22][23][24][25]. Many different methods can be used for the production of ZnO nanostructures, such as molecular beam epitaxy, metal organic chemical vapor deposition, chemical vapor deposition, physical vapor deposition, vapor-liquid-solid reaction, pulsed laser deposition, sputtering, spray pyrolysis and sol-gel processing [26][27][28][29][30][31][32][33]. Among these methods, the sol-gel method has higher popularity and industrial application than other existing methods due to its many advantageous aspects [34].…”
Section: Introductionmentioning
confidence: 99%
“…These characteristic features of ZnO are the main reason why it is frequently preferred by researchers [22][23][24][25]. Many different methods can be used for the production of ZnO nanostructures, such as molecular beam epitaxy, metal organic chemical vapor deposition, chemical vapor deposition, physical vapor deposition, vapor-liquid-solid reaction, pulsed laser deposition, sputtering, spray pyrolysis and sol-gel processing [26][27][28][29][30][31][32][33]. Among these methods, the sol-gel method has higher popularity and industrial application than other existing methods due to its many advantageous aspects [34].…”
Section: Introductionmentioning
confidence: 99%