Photomask Technology 2022 2022
DOI: 10.1117/12.2641625
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Investigation of stochastic roughness effects for nanoscale grating characterization with a stand-alone EUV spectrometer

Abstract: Fast and non-destructive non-imaging metrology of nanostructures is crucial for the development of integrated circuits and for the corresponding in-situ metrology within fabrication processes. Stochastic variations related to the gratings local period (line edge roughness, LER) and line width (line width roughness, LWR) are of special interest due to their key role for the minimal achievable structure size. Non-imaging metrology approaches taking these statistic variations into account are quite limited. For s… Show more

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